Ion Implantation Science and Technology
2. Auflage
Erschienen am 2. Dezember 2012
508 Seiten
978-0-323-16165-7 (ISBN)
Beschreibung
Ion Implantation Science and Technology: Second Edition, just like the first edition, serves as both an introduction and tutorial to the science, techniques, and machines involved in the subject. The book is divided into two parts - Part 1: Ion Implantation Science and Part 2: Ion Implantation Technology. Part 1 covers topics such as the stopping and range of ions in solids; ion implantation damage in silicon; experimental annealing and activation; and the measurement on ion implantation. Part 2 includes ion optics and focusing on implanter design; photoresist problems and particle contamination; ion implantation diagnostics and process control; and emission of ionizing radiation from ion implanters. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.
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Buch
01/1988
Academic Press
99,39 €
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Vorauflage
J. F. Ziegler
Ion Implantation Science and Technology
E-Book
12/2012
1. Auflage
Academic Press
54,95 €
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Inhalt
ContentsContributors PrefacePart I: Ion Implantation Science The Stopping and Range of Ions in Solids Ion Implantation Damage in Silicon Experimental Annealing and Activation Measurement of Ion Implantation Part II: Ion Implantation Technology An Introduction to Ion Sources Ion Optics and Focusing in Implanter Design Wafer Cooling, Faraday Design and Wafer Charging Photoresist Problems and Particle Contamination Ion Implantation Diagnostics and Process Control Safety Considerations for Ion Implanters Emission of Ionizing Radiation from Ion ImplantersIndex
