Ion Implantation Science and Technology
1. Auflage
Erschienen am 2. Dezember 2012
648 Seiten
978-0-323-14401-8 (ISBN)
Beschreibung
Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.
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J. F. Ziegler
Ion Implantation Science and Technology
E-Book
12/2012
2. Auflage
Academic Press
54,95 €
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01/1984
Academic Press
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Inhalt
ContentsContributors Preface Part I: Ion Implantation Science The Historical Development of Ion Implantation The Stopping and Range of Ions in Solids Ion Implantation Damage in Silicon Damage Annealing in Silicon and Electrical Activity Measurement of Electrically Active Dopants Ion Implantation Metallurgy Part II: Ion Implantation Technology Ion Implantation System Concepts An Introduction to Ion Sources Some Principles Underlying Ion Optics Design Mapping of Ion Implanted Wafers Measurement and Control of Ion Implantation Accelerator Parameters Ion Implantation: Safety and Radiation ConsiderationsIndex
