Volume is indexed by Thomson Reuters CPCI-S (WoS).
These proceedings describe the most recent advances and trends in the fields of dusty and colloidal plasmas: a new discipline which is highly relevant to those working on nanostructured materials, nanotechnologies and devices which are processed using plasma and fusion tools. For instance, in the case of thin-film devices, the production of new materials such as polymorphous or quasi-morphous silicon or even silicon nanotubes is highly dependent upon the production of particles, in the plasma, which are suitable for incorporation into the films produced. Therefore, it is very important to know how dusty and colloidal plasmas behave, and how high-grade electronic films can be processed under such conditions.
Reihe
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Für höhere Schule und Studium
Für Beruf und Forschung
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Illustrations, unspecified
Dateigröße
ISBN-13
978-3-0357-0566-9 (9783035705669)
DOI
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Schweitzer Klassifikation
Preface
Processing of Thin Film Silicon Solar Cells under Ionic Bombardment Control
Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films
Silicon Films Produced by PECVD under Powder Formation Conditions
Microgravity Experiments in the MIR Space Station
Laser-Excited Mach Cones in Plasma Crystals
Laser Excitation of Oscillations and Waves in Dust Crystals: a Tutorial
Charging Kinetics of Dust Particles with a Variable Mass
Influence of Dust Particles on Sheaths in an Oblique Magnetic Field
Radio Frequency Discharge with Dust Particles
