Chemical Vapour Deposition

Chemical vapour deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials. In typical CVD, the substrate is exposed to volatile precursors, which react or decompose on the surface to produce the desired material.

This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations. By demonstrating the methodology behind the modelling and simulation of CVD growth processes, the text provides guidance and practical advice on how to acquire successful theoretical results. For this purpose, demonstrations based on recent investigations are used. The knowledge obtained within this book will be invaluable for the improvement of growth processes for existing materials, and in the development of CVD/ALD setups for new and innovative materials. More generally, the book will be of great use within atomic-level studies of any chemical process on a solid-state surface.

By offering instructions for the practical handling of calculations, the book can be used for a variety of purposes (as a course textbook, a practical instruction book, or a starting book for someone just beginning to conduct theoretical calculations with solid surface models). The book includes worked examples, case studies, end-of-chapter summaries and animations of atomic-level surface processes. After reading the text, researchers and students will have the knowledge they need to tailor-make desired growth processes for the deposition of materials with specific properties.