The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Reihe
Sprache
Verlagsort
Zielgruppe
Für höhere Schule und Studium
Produkt-Hinweis
Fadenheftung
Gewebe-Einband
Illustrationen
2 colour plates, 5 halftones, numerous line figures
Maße
Höhe: 245 mm
Breite: 164 mm
Dicke: 24 mm
Gewicht
ISBN-13
978-0-19-856287-0 (9780198562870)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Klassifikation
Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430
Autor*in
ProfessorProfessor, Hachinohe Institute of Technology, Japan
1. Introduction ; 2. RF discharges ; 3. Physical basis of plasma etching process ; 4. Diagnostics of plasma particles and potentials ; 5. Technology of reactive ion etching ; 6. Magnetic field coupled etchers ; 7. ECR plasma etchers ; 8. Future propects ; Index
