Preface
PART 1. GENERAL PAPERS
High sensitivity rapid detection of particulate contamination
M. Vaez-Iravani and S. Stokowski
Detection of particles on surfaces using evanescent wave scattering
L. Suresh, J. Y. Walz and E. D. Hirleman
Metallic contamination from particles on the backside of wafers
M. Simard-Normandin, F. Beaudoin and M. Meunier
The effect of fluid dynamics on particle shedding from semiconductor fluid-handling components
W. Kelly, D. C. Grant, G. Van Schooneveld, D. Carrieri, D. Smith, A. Rodemeyer and D. Henderson
Influence of surface charge on particle dispersion/aggregation as determined by atomic force microscopy
S. Veeramasuneni and J. D. Miller
Synthesis of composite particles by a dry coating technique
A. Ata and R. K. Singh
PART 2. PARTICLE ADHESION AND REMOVAL
Particles, surfaces and turbulent fluid flow: the dynamics of adhesion
N. Vatistas
The role of cetyl pyridinium chloride in reducing adhesion forces between alumina particles and quartz surfaces
M. L. Free and D. O. Shah
The effect of various surfactants on adhesion of fine particles to polycarbonate lenses and on the scratches produced during wiping process
H. Fang and D. O. Shah
Precision cleaning and processing in industrial applications
R. Kohli
Co-solvents in supercritical fluids for enhanced effectiveness in particle removal
R. Kohli
Hydrodynamic removal of fine particles from solid surfaces
S. K. Das and M. M. Sharma
Study of high-speed droplet impingement on solid surfaces
N. Hirano, K. Takayama, J. Falcovitz and K. Kitagawa
Measurements and modelling of megasonic cleaning processes
R. Gouk, D. B. Kittelson, T. H. Kuehn and Y. Wu
Co2 (dry-ice) particle blasting as a mainstream cleaning alternative
D. R. Linger
Carbon dioxide snow cleaning
R. Sherman
Argon aerosol surface cleaning: an overview
W. McDermott and P. Sferlazzo
Development and optimization of a cryogenic aerosol-based wafer cleaning system
N. Narayanswami, J. Heitzinger, J. Patrin, D. Rader, T. O'Hern and J. Torczynski
Radiance process evaluation for particle removal
R. N. Legge, D. J. Convey, J. D. Peterson, C. M. Freeman, D. L. Thompson, T. R. O'Keeffe, A. C. Engelsberg, A. F. Cruz, M. E. King and P. M. Randall
Chemically assisted laser removal of photoresist and particles from semiconductor wafers
M. Genut, Y. Uziel, O. Tehar-Zahav, I. Barzilay and B. Livshits
Removal of particulate contamination from silicon surfaces with laser-based cleaning technology
S. Boughaba, J. B. HA (c)roux, M. Curcio, E. Sacher and M. Meunier
Removal of particulate and film contaminants by impacting surfaces with microcluster beams
J. F. Mahoney, J. Perel, C. Sujo and J. Andersen
Post-CMP particle removal using a Capella brush cleaner
A. Jha, M. Sauer, C. Gensler, A. Blazev, S. Basak, S. Zhu, D. Wagner and A. Gupta
Particle removal from semiconductor surfaces by chemical-mechanical cleaning: setting the record straight
I. J. Malik and W. C. Krusell
