Part 1 New trends in electrochemical technology: future perspectives in electrochemical processing and technology, N. Masuko and T. Tsuda; high density magnetic recording media prepared by electroless-plating method, T. Osaka and T. Homma; metallurgical analysis of mechanical properties of electroless copper deposits, S. Nakahara and Y. Okinaka; synthesis of advanced materials byelectrochemical processing by nonaqueous media, D.R. Sadoway. Part 2 New methods of electrochemical approaches: the electrochemical QCM (quartz crystal microbalance) method, W.H. Smyrl and M. Lein; multichannel spectroscopic ellipsometry for real time analysis of electrochemical and plasma deposition of thin films, R.W. Collins; real-time, submonolayer monitoring of electrochemical processes using acoustic plate mode devices, A.J. Ricco and S.J. MArtin; photoacoustic applications to the solid/liquid interface, A. Fujishima and S. Yoshihara; in situ scanning tunnelling microscopy of electrode/solution interfaces, K. Itaya; microtopography of electrochemical surface layers, R.H. Muller; laser interferometry as an in-situ technique to characterize electrochemical processes, Y. Fukunaka et al; photocurrent and photopotential transients of n- and p-GaAs and n- and p-InP, W. Plieth et al; electrochemical analysis of electrode in plasma and its applications, S. Ito.
