Beyond enabling new capabilities, plasma-based techniques, characterized by quantum radicals of feed gases, hold the potential to enhance and improve many processes and applications. Following in the tradition of its popular predecessor, Plasma Electronics, Second Edition: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods required to bring these technologies from the laboratory to the factory.
Emphasizing computational algorithms and techniques, this updated edition of a popular monograph supplies a complete and up-to-date picture of plasma physics, computational methods, applications, and processing techniques. Reflecting the growing importance of computer-aided approaches to plasma analysis and synthesis, it showcases recent advances in fabrication from micro- and nano-electronics, MEMS/NEMS, and the biological sciences.
A helpful resource for anyone learning about collisional plasma structure, function, and applications, this edition reflects the latest progress in the quantitative understanding of non-equilibrium low-temperature plasma, surface processing, and predictive modeling of the plasma and the process. Filled with new figures, tables, problems, and exercises, it includes a new chapter on the development of atmospheric-pressure plasma, in particular microcell plasma, with a discussion of its practical application to improve surface efficiency.
The book provides an up-to-date discussion of MEMS fabrication and phase transition between capacitive and inductive modes in an inductively coupled plasma. In addition to new sections on the phase transition between the capacitive and inductive modes in an ICP and MOS-transistor and MEMS fabrications, the book presents a new discussion of heat transfer and heating of the media and the reactor.
Integrating physics, numerical methods, and practical applications, this book equips you with the up-to-date understanding required to scale up lab breakthroughs into industrial innovations.
Rezensionen / Stimmen
"This text serves both the expert and the newcomer with background and state-of-the-art knowledge of plasma electronics. It should be on the bookshelf of anyone exploiting plasma technology for device fabrication. Clearly written and well illustrated, it is also suitable as a postgraduate teaching text and, having been updated, may be a standard reference for the next decade."
-Nigel J. Mason, Professor, Department of Physical Sciences, The Open University
"This book is a unique and invaluable source of insight and clarity with special strengths in treating charged particle-neutral collisions, rigorously generalized with proper kinetic theory. This rigor in analyzing discharge physics fundamentals makes the subsequent treatment of plasma modeling and surface modification applications in microelectronics even more valuable. It will no doubt become a standard reference for all scientists and engineers interested in weakly ionized, non-equilibrium plasmas."
-David B. Graves, Professor and Lam Research Distinguished Chair, Department of Chemical and Biomolecular Engineering, University of California, Berkeley
"... unique in the low-temperature plasma literature for the breadth of its aims and wide-ranging scope, and I would strongly recommend as a reference for postgraduate students in the field."
-Robert E. Robson, Professor, James Cook University
"This book discusses the fundamental principles of partially ionized, chemically reactive plasma discharges and their use in thin film processing ... a well-written book for plasma engineers and scientists. ... [they] will benefit a lot from this book ..."
-Hong-Young Chang, Professor, Korean Advanced Institute of Science and Technology (KAIST)
"A unique textbook written by two of the most outstanding scientists in the field ... A very valuable part of the book is devoted to modeling and numerical simulation ... an indispensable source of knowledge and an excellent reference for all kinds of basic phenomena."
-Uwe Czarnetzki, Professor and Chair, Faculty of Physics and Astronomy, Ruhr-Universitaet Bochum
"The book offers a truly excellent account on the fundamental physics of low-temperature plasmas and applications of low-temperature plasmas to other scientific disciplines and technologies. I strongly recommend this book to both newcomers as a high-standard introductory textbook and experts as a comprehensive reference."
-Satoshi Hamaguchi, Professor, Center for Atomic and Molecular Technologies, Osaka University
Auflage
Sprache
Verlagsort
Verlagsgruppe
Zielgruppe
Für höhere Schule und Studium
Für Beruf und Forschung
Graduate students, scientists, and industrial engineers in physics, chemistry, materials, electronics, and optics/photonics.
Illustrationen
176 s/w Abbildungen, 49 s/w Tabellen
49 Tables, black and white; 176 Illustrations, black and white
Maße
Höhe: 240 mm
Breite: 161 mm
Dicke: 27 mm
Gewicht
ISBN-13
978-1-4822-2205-0 (9781482222050)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Klassifikation
Toshiaki Makabe received his BSc, MSc, and Ph.D. degrees in electrical engineering all from Keio University. He became a Professor of Electronics and Electrical Engineering in the Faculty of Science and Technology at Keio University in 1991. He also served as a guest professor at POSTECH, Ruhr University Bochum, and Xi'an Jiaotong University. He was Dean of the Faculty of Science and Technology and Chair of the Graduate School from 2007 to 2009. Since 2009, he has been the Vice-President of Keio University in charge of research. He has published more than 170 papers in peer-reviewed international journals, and has given invited talks at more than 80 international conferences in the field of non-equilibrium, low-temperature plasmas and related basic transport theory, and surface processes. He is on the editorial board of Plasma Sources Science and Technology, and many times he has been a guest editor of the special issue about the low temperature plasma and the surface process of the Japanese Journal of Applied Physics, Australian Journal of Physics, Journal of Vacuum Science and Technology A, IEEE Transactions on Plasma Science, and Applied Surface Science, etc. He received the awards; "Fluid Science Prize" in 2003 from the Institute of Fluid Science, Tohoku University, "Plasma Electronics Prize" in 2004 from the Japan Society of Applied Physics, "Plasma Prize" in 2006 from the American Vacuum Society, etc. He is an associate member of the Science Council of Japan, and a foreign member of the Serbian Academy of Sciences and Arts. He is a fellow of the Institute of Physics, the American Vacuum Society, the Japan Society of Applied Physics, and the Japan Federation of Engineering Societies.
Zoran Lj. Petrovic obtained his Master's degree in the Department of Applied Physics, Faculty of Electrical Engineering in the University of Belgrade, and earned his Ph.D from Australian National University. He is the Head of the Department of Experimental Physics in the Institute of Physics, University of Belgrade. He has taught postgraduate courses in microelectronics, plasma kinetics and diagnostics and was a visiting professor in Keio University (Yokohama, Japan). He has received the Nikola Tesla award for technological achievement and the Marko Jaric Award for Great Achievement in Physics. He is a full member of the Academy of Engineering Sciences of Serbia and Serbian Academy of Sciences and Arts where he chairs the department of engineering science. Zoran Petrovic is a fellow of American Physical Society, vice president of the National Scientific Council of Serbia, and president of the Association of Scientific Institutes of Serbia. He is a member of editorial boards of Plasma Sources Science and Technology and Europena Physical Journal D. He has authored or co-authored over 220 papers in leading international scientific journals, and has given more than 90 invited talks at professional conferences. His research interests include atomic and molecular collisions in ionized gases, transport phenomena in ionized gases, gas breakdown, RF and DC plasmas for plasma processing, plasma medicine, positron collisions and traps, and basic properties of gas discharges.
Autor*in
Keio University, Minato-ku, Tokyo, Japan
University of Belgrade, Zemun, Serbia
Introduction. Phenomenological Description of the Charged Particle Transport. Macroscopic Plasma Characteristics. Elementary Processes in Gas Phase and on Surfaces. The Boltzmann Equation and Transport Equations of Charged Particles. General Properties of Charged Particle Transport in Gases. Modeling of Nonequilibrium(Low Temperature) Plasmas. Numerical Procedure of Modeling. Capacitively Coupled Plasma. Inductively Coupled Plasma.
Magnetically Enhanced Plasma. Plasma Processing and Related Topics. Atmospheric Pressure, Low Temperature Plasma.
