Principles of Electron Optics: Applied Geometrical Optics, Second Edition gives detailed information about the many optical elements that use the theory presented in Volume 1: electrostatic and magnetic lenses, quadrupoles, cathode-lens-based instruments including the new ultrafast microscopes, low-energy-electron microscopes and photoemission electron microscopes and the mirrors found in their systems, Wien filters and deflectors. The chapter on aberration correction is largely new. The long section on electron guns describes recent theories and covers multi-column systems and carbon nanotube emitters. Monochromators are included in the section on curved-axis systems.
The lists of references include many articles that will enable the reader to go deeper into the subjects discussed in the text.
The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography.
Auflage
Sprache
Verlagsort
Verlagsgruppe
Elsevier Science Publishing Co Inc
Zielgruppe
Für Beruf und Forschung
Postgraduate students and teachers in physics and electron optics; researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy, and nanolithography
Maße
Höhe: 235 mm
Breite: 191 mm
Gewicht
ISBN-13
978-0-12-813369-9 (9780128133699)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Klassifikation
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 - 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics. Erwin Kasper studied physics at the Universities of Muenster and Tuebingen (Germany), where he obtained his PhD in 1965 and the habilitation to teach physics in 1969. After scientific spells in the University of Tucson, Arizona (1966) and in Munich (1970), he resumed his research and teaching in the Institute of Applied Physics, University of Tuebingen, where he was later appointed professor. He lectured on general physics and especially on electron optics. The subject of his research was theoretical electron optics and related numerical methods on which he published numerous papers. After his retirement in 1997, he published a book on numerical field calculation (2001).
Autor*in
Founder-President of the European Microscopy Society and Fellow, Microscopy and Optical Societies of America; member of the editorial boards of several microscopy journals and Serial Editor, Advances in Electron Optics, France
Institute of Applied Physics, University of Tuebingen, Tuebingen, Germany
PART VII - INSTRUMENTAL OPTICS
35. Electrostatic Lenses
36. Magnetic Lenses
37. Electron Mirrors, Low-energy-electron Microscopes and Photoemission Electron Microscopes, Cathode Lenses and Field-emisssion Microscopy
38. The Wien Filter
39. Quadrupole Lenses
40. Deflection Systems
PART VIII - ABERRATION CORRECTION AND BEAM INTENSITY DISTRIBUTION (CAUSTICS)
41. Aberration Correction
42. Caustics and their Applications
PART IX - ELECTRON GUNS
43. General Features of Electron Guns
44. Theory of Electron Emission
45. Pointed Cathodes without Space Charge
46. Space Charge Effects
47. Brightness
48. Emittance
49. Gun optics
50. Complete Electron Guns
PART X - SYSTEMS WITH A CURVED OPTIC AXIS
51. General Curvilinear Systems
52. Magnetic Sector Fields
53. Unified Theories of Ion Optical Systems