This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.
Reihe
Sprache
Verlagsort
Verlagsgruppe
Elsevier Science Publishing Co Inc
Zielgruppe
Maße
Höhe: 229 mm
Breite: 152 mm
Gewicht
ISBN-13
978-0-12-533018-3 (9780125330183)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Klassifikation
Herausgeber*in
Georgia State University, Atlanta, U.S.A.
Reihen-Herausgeber
Design of High- Density Plasma Sources for Materials Processing
M.A. Lieberman and R.A. Gottscho
Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films
O.A. Popov
Unbalanced Magnetron Sputtering
S.L. Rohde
The Formation of Particles in Thin-Film Processing Plasmas
Steinbruchel
