Optical and Electrical Properties of CAO/Si Thin Film

This book explains mechanism to prepare CuAlO2 thin film by used spray pyrolysis technique where the thin film deposited on n-type silicon, The solution was mixture of copper chloride (CuCl2.2H2O) and aluminum chloride (Al2Cl3.2H2O) salts with different concentration (1:1), (1:2), and (2:1) of (Cu: Al) ratio. It has been found that the concentration of (1:1) is the best and selected to be the ratio used to prepare thin film for studying the effect of laser annealing on the optical, structural, electrical and optoelectronic properties, where the laser annealing has been done at different energy fluence (300, 600, 900 and 1200) mJ/cm2.