
Subsecond Annealing of Advanced Materials
Annealing by Lasers, Flash Lamps and Swift Heavy Ions
Springer (Verlag)
Erschienen am 30. Dezember 2013
Buch
Hardcover
XVII, 321 Seiten
978-3-319-03130-9 (ISBN)
Beschreibung
The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.
Weitere Details
Reihe
Auflage
2014 ed.
Sprache
Englisch
Verlagsort
Cham
Schweiz
Verlagsgruppe
Springer International Publishing
Zielgruppe
Für Beruf und Forschung
Research
Illustrationen
59 farbige Abbildungen, 146 s/w Abbildungen
XVII, 321 p. 205 illus., 59 illus. in color.
Maße
Höhe: 241 mm
Breite: 160 mm
Dicke: 24 mm
Gewicht
676 gr
ISBN-13
978-3-319-03130-9 (9783319031309)
DOI
10.1007/978-3-319-03131-6
Schweitzer Klassifikation
Weitere Ausgaben
Inhalt
From the Contents: The very early time.- Nanonet formation by constitutional supercooling of pulsed laser annealed, Mn-implanted germanium.- Metastable activation of dopants by solid phase epitaxial recrystallization.- Superconducting Ga-implanted Germanium.- Structural changes in SiGe/Si layers induced by fast crystallization.