The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.
Reihe
Auflage
Sprache
Verlagsort
Verlagsgruppe
Springer International Publishing
Zielgruppe
Für Beruf und Forschung
Research
Illustrationen
59
146 s/w Abbildungen, 59 farbige Abbildungen
XVII, 321 p. 205 illus., 59 illus. in color.
Maße
Höhe: 241 mm
Breite: 160 mm
Dicke: 24 mm
Gewicht
ISBN-13
978-3-319-03130-9 (9783319031309)
DOI
10.1007/978-3-319-03131-6
Schweitzer Klassifikation
From the Contents: The very early time.- Nanonet formation by constitutional supercooling of pulsed laser annealed, Mn-implanted germanium.- Metastable activation of dopants by solid phase epitaxial recrystallization.- Superconducting Ga-implanted Germanium.- Structural changes in SiGe/Si layers induced by fast crystallization.
