Preface
1: Zhenan Bao: Recent Progress in Materials for Organic Electronics
2: Kyungkon Kim, Guolun Zhong, Jung-Il Jin, Jung Ho Park, Seoung Hyun Lee, Dong Woo Kim, Yung Woo Park, and Whikun Yi: PPV Nanotubes, Nanorods, and Nanofilms as well as Carbonized Objects Derived Therefrom
3: M.E. van der Boom and T.J. Marks: Layer-by-Layer Assembly of Molecular Materials for Electrooptical Applications
4: Sung-Yeon Jang, Manuel Marquez, and Gregory A. Sotzing: Oxidative Solid-State Cross-Linking of Polymer Precursors to Pattern Intrinsically Conducting Polymers
5: T.H. Fedynyshyn, W.A. Mowers, R.R. Kunz, R.F. Sinta, M. Sworin, A. Cabral, and J. Curtin: Fluorocarbon Polymer-Based Photoresists for 157-nm Lithography
6: Toshiro Itani, Hiroyuki Watanabe, Tamio Yamazaki, Seichi Ishikawa, Naomi Shida, and Minoru Toriumi: 157-nm Resist Materials Using Main-Chain Fluorinated Polymers
7: Ronald L. Jones, Vivek M. Prabhu, Dario L. Goldfarb, Eric K. Lin, Christopher L. Soles, Joseph L. Lenhart, Wen-li Wu, and Marie Angelopoulos: Correlation of the Reaction Front with Roughness in Chemically Amplified Photoresists
8: Joseph L. Lenhart, Daniel A. Fischer, Sharadha Sambasivan, Eric K. Lin, Christopher L. Soles, Ronald L. Jones, Wen-li Wu, Dario L. Goldfarb, and Marie Angelopoulos: Utilizing Near Edge X-ray Absorption Fine Structure to Probe Interfacial Issues in Photolithography
9: B. Voit, F. Braun, Ch. Loppacher, S. Trogisch, L.M. Eng, R. Seidel, A. Gorbunoff, W. Pompe, and M. Mertig: Photolabile Ultrathin Polymer Films for Spatially Defined Attachment of Nano Elements
10: Martin Brehmer, Lars Conrad, Lutz Funk, Dirk Allard, Patrick Theato, and Anke Helfer: Soft Lithography on Block Copolymer Films: Generating Functionalized Patterns on Block Copolymer Films as a Basis to Further Surface Modification
11: R.D. Miller, W. Volksen, V.Y. Lee, E. Conner, T. Magbitang, R. Zafran, L. Sundberg, C.J. Hawker, J.L. Hedrick, E. Huang, M. Tooney, Q.R. Huang, C.W. Frank, and H.-C. Kim: Nanoporous, Low-Dielectric Constant Organosilicate Materials Derived from Inorganic Polymer Blends
12: C. Tyberg, E. Huang, J. Hedrick, E. Simonyi, S. Gates, S. Cohen, K. Malone, H. Wickland, M. Sankarapandian, M. Toney, H.-C. Kim, R. Miller, W. Volksen, P. Rice, and L. Lurio: Porous Low-k Dielectrics: Material Properties
13: Bianxiao Zhong and Eric S. Moyer: Ultra Low-k Dielectic Films with Ultra Small Pores Using Poragens Chemically Bonded to Silozane Resin
14: H. Craig Silvis, Kevin J. Bouck, James P. Godschalx, Q. Jason Niu, Michael J. Radler, Ted M. Stokich, John W. Lyons, Brandon J. Kern, Joan G. Marshall, Karin Syverud, and Mary Leff: Design of Nanoporous Polyarylene Polymers for Use as Low-k Dielectrics in Microelectronic Devices
15: Q. Jason Niu, Steven J. Martin, James P. Godschalx, and Paul H. Townsend: Molecular Brushes as Templating Agents for Nanoporous SiLK* Dielectric Films
16: Christopher L. Soles, Hae-Jeong Lee, Ronald C. Hedden, Da-wei Liu, Barry J. Bauer, and Wen-li Wu: X-ray Reflectivity as a Metrology to Characterize Pores in Low-k Dielectric Films
17: Sara N. Paisner and Joseph M. DeSimone: Micro- and Nanoporous Materials Developed Using Supercritical CO2: Novel Synthetic Methods for the Development of Micro- and Nanoporous Materials Toward Microelectronic Applications
18: Masamitsu Shirai, Satoshi Morishita, Akiya Kawaue, Haruyuki Okamura, and Masahiro Tsunooka: Thermally Degradable Photocross-Linking Polymers
19: Robert K. Oldak and Raymond A. Pearson: Evaluation of Infrared Spectroscopic Techniques to Assess Molecular Interactions
20: Zhuqing Zhang and C.P. Wong: Study on Metal Chelates as Catalysts of Epoxy and Anhydride Cure Reactions for No-Flow Underfill Applications
21: Ying-Hung So, Phil E. Garrou, Jang-Hi Im, and Karou Ohba: Benzocyclobutene-Based Polymers for Microelectronic Applications
22: A.L.Cholli, S.K. Sahoo, D.W. Kim, J. Kumar, and A. Blumstein: Formation of Nanocomposites by In Situ Intercalative Polymerization of 2-Ethynylpyrdine in Layered Aluminosilicates: A Solid-State NMR Study
Author Index
Subject Index
