Diffusion Controlled Growth and Oxidation of Metal-Silicides
Published on 10. May 2019
Software
Digital media
202 pages
978-3-0357-2505-6 (ISBN)
Description
Silicide intermetallics are widely used in various applications such as microelectronics, structural and coating industries. Some aspects of the diffusion-controlled growth and oxidation of metal-silicides are presented in this volume of the journal.
More details
Series
Language
English
Place of publication
Switzerland
Publishing group
Trans Tech Publications
Target group
Professional and scholarly
Dimensions
Height: 142 mm
Width: 125 mm
Thickness: 10 mm
Weight
200 gr
ISBN-13
978-3-0357-2505-6 (9783035725056)
DOI
10.4028/www.scientific.net/DF.21
Schweitzer Classification
Other editions
Additional editions
Book
05/2019
Trans Tech Publications Ltd
€207.98
Shipment within 10-20 days
E-Book
03/2019
Trans Tech Publications Ltd
€200.09
Available for download
Person
Ed. Prof. Aloke Paul
Content
Mechanisms of Silicide Formation by Reactive Diffusion in Thin FilmsDiffusion Rates of Components in Metal-Silicides Depending on Atomic Number of Refractory Metal ComponentDiffusion-Limited Reactions of Non-Oxide Ceramics with Transition MetalsOxidation Behavior of SilicidesPeriodic Layer Formation during Multiphase Diffusion in Silicide Systems