Diffusion Controlled Growth and Oxidation of Metal-Silicides
Published on 10. May 2019
Book
Paperback/Softback
202 pages
978-3-0357-1505-7 (ISBN)
Description
Silicide intermetallics are widely used in various applications such as microelectronics, structural and coating industries. Some aspects of the diffusion-controlled growth and oxidation of metal-silicides are presented in this volume of the journal.
More details
Series
Language
English
Place of publication
Zurich
Switzerland
Target group
Professional and scholarly
Illustrations
Illustrations, unspecified
Dimensions
Height: 240 mm
Width: 170 mm
Thickness: 10 mm
Weight
480 gr
ISBN-13
978-3-0357-1505-7 (9783035715057)
DOI
10.4028/b-bISv5I
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Classification
Other editions
Additional editions
Software
05/2019
Trans Tech Publications Ltd
€192.76
Shipment within 10-20 days
E-Book
03/2019
Trans Tech Publications Ltd
€200.09
Available for download
Person
Ed. Prof. Aloke Paul
Content
Preface
Mechanisms of Silicide Formation by Reactive Diffusion in Thin Films
Diffusion Rates of Components in Metal-Silicides Depending on Atomic Number of Refractory Metal Component
Diffusion-Limited Reactions of Non-Oxide Ceramics with Transition Metals
Oxidation Behavior of Silicides
Periodic Layer Formation during Multiphase Diffusion in Silicide Systems
Mechanisms of Silicide Formation by Reactive Diffusion in Thin Films
Diffusion Rates of Components in Metal-Silicides Depending on Atomic Number of Refractory Metal Component
Diffusion-Limited Reactions of Non-Oxide Ceramics with Transition Metals
Oxidation Behavior of Silicides
Periodic Layer Formation during Multiphase Diffusion in Silicide Systems