Diffusion Controlled Growth and Oxidation of Metal-Silicides
Published on 11. March 2019
202 pages
978-3-0357-3505-5 (ISBN)
Description
Silicide intermetallics are widely used in various applications such as microelectronics, structural and coating industries. Some aspects of the diffusion-controlled growth and oxidation of metal-silicides are presented in this volume of the journal.
More details
Series
Language
English
Place of publication
Zurich-Durnten
Switzerland
Target group
Professional and scholarly
Illustrations
Illustrations, unspecified
File size
35,69 MB
ISBN-13
978-3-0357-3505-5 (9783035735055)
DOI
10.4028/b-bISv5I
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Schweitzer Classification
Other editions
Additional editions
Book
05/2019
Trans Tech Publications Ltd
€207.98
Shipment within 10-20 days
Software
05/2019
Trans Tech Publications Ltd
€192.76
Shipment within 10-20 days
Person
Ed. Prof. Aloke Paul
Content
Preface
Mechanisms of Silicide Formation by Reactive Diffusion in Thin Films
Diffusion Rates of Components in Metal-Silicides Depending on Atomic Number of Refractory Metal Component
Diffusion-Limited Reactions of Non-Oxide Ceramics with Transition Metals
Oxidation Behavior of Silicides
Periodic Layer Formation during Multiphase Diffusion in Silicide Systems
Mechanisms of Silicide Formation by Reactive Diffusion in Thin Films
Diffusion Rates of Components in Metal-Silicides Depending on Atomic Number of Refractory Metal Component
Diffusion-Limited Reactions of Non-Oxide Ceramics with Transition Metals
Oxidation Behavior of Silicides
Periodic Layer Formation during Multiphase Diffusion in Silicide Systems
