Ion Implantation Technology
16th International Conference on Ion Implantation Technology; IIT 2006
American Institute of Physics (Publisher)
1st Edition
Published on 1. February 2007
Software
CD-ROM
664 pages
978-0-7354-0366-6 (ISBN)
Description
This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.
More details
Series
Edition
1., 2006
Language
English
Place of publication
New York
United States
Target group
Professional and scholarly
Research
ISBN-13
978-0-7354-0366-6 (9780735403666)
Schweitzer Classification
Other editions
Additional editions
Karen J. Kirkby | Russell Gwilliam | Andy Smith
Ion Impantation Technology
16th International Conference on Ion Implantation Technology; IIT 2006
Book
12/2006
1st Edition
American Institute of Physics
€178.80
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