Ion Impantation Technology
16th International Conference on Ion Implantation Technology; IIT 2006
American Institute of Physics (Publisher)
1st Edition
Published on 28. December 2006
Book
Hardback
XVIII, 664 pages
978-0-7354-0365-9 (ISBN)
Description
This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.
More details
Series
Edition
1., 2006
Language
English
Place of publication
New York
United States
Target group
Professional and scholarly
Research
Illustrations
Illustrations, charts, ports.
Dimensions
Height: 27.7 cm
Width: 21 cm
Weight
1897 gr
ISBN-13
978-0-7354-0365-9 (9780735403659)
Schweitzer Classification
Other editions
Additional editions
Karen J. Kirkby | Russell M. Gwilliam | Andy Smith
Ion Implantation Technology
16th International Conference on Ion Implantation Technology; IIT 2006
Software
02/2007
1st Edition
American Institute of Physics
€132.86
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