Subsecond Annealing of Advanced Materials
Annealing by Lasers, Flash Lamps and Swift Heavy Ions
1st Edition
Published on 16. December 2013
XVII, 321 pages
978-3-319-03131-6 (ISBN)
Description
The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.
More details
Series
Language
English
Place of publication
Cham
Switzerland
Publishing group
Springer International Publishing
Target group
Professional and scholarly
Product notice
Reflowable
Illustrations
XVII, 321 p. 205 illus., 59 illus. in color.
File size
11,83 MB
ISBN-13
978-3-319-03131-6 (9783319031316)
DOI
10.1007/978-3-319-03131-6
Schweitzer Classification
Other editions
Additional editions
Wolfgang Skorupa | Heidemarie Schmidt
Subsecond Annealing of Advanced Materials
Annealing by Lasers, Flash Lamps and Swift Heavy Ions
Book
12/2013
Springer
€53.49
Shipment within 10-15 days
Content
From the Contents: The very early time.- Nanonet formation by constitutional supercooling of pulsed laser annealed, Mn-implanted germanium.- Metastable activation of dopants by solid phase epitaxial recrystallization.- Superconducting Ga-implanted Germanium.- Structural changes in SiGe/Si layers induced by fast crystallization.
