Spacer Engineered FinFET Architectures
High-Performance Digital Circuit Applications
1st Edition
Published on 26. June 2017
154 pages
978-1-351-75103-2 (ISBN)
Description
This book focusses on the spacer engineering aspects of novel MOS-based device-circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
More details
Edition
1. Auflage
Language
English
Place of publication
London
United Kingdom
Publishing group
Taylor & Francis Ltd
Target group
College/higher education
Product notice
Reflowable
Illustrations
14 s/w Photographien bzw. Rasterbilder, 39 farbige Abbildungen, 3 s/w Tabellen, 49 s/w Abbildungen
3 Tables, black and white; 14 Halftones, black and white; 39 Illustrations, color; 49 Illustrations, black and white
ISBN-13
978-1-351-75103-2 (9781351751032)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Classification
Other editions
Additional editions
Sudeb Dasgupta | Brajesh Kumar Kaushik | Pankaj Kumar Pal
Spacer Engineered FinFET Architectures
High-Performance Digital Circuit Applications
Book
06/2020
1st Edition
CRC Press
€64.36
Shipment within 15-20 days
Sudeb Dasgupta | Brajesh Kumar Kaushik | Pankaj Kumar Pal
Spacer Engineered FinFET Architectures
High-Performance Digital Circuit Applications
Book
06/2017
1st Edition
CRC Press
€230.27
Shipment within 15-20 days
Persons
Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal
Content
Preface
About the Authors
Chapter 1 ? Introduction to Nanoelectronics
Chapter 2 ? Tri-Gate FinFET Technology and Its Advancement
Chapter 3 ? Dual-k Spacer Device Architecture and Its Electrostatics
Chapter 4 ? Capacitive Analysis and Dual-k FinFET-Based Digital Circuit Design
Chapter 5 ? Design Metric Improvement of a Dual-k-Based SRAM Cell
Chapter 6 ? Statistical Variability and Sensitivity Analysis
INDEX
About the Authors
Chapter 1 ? Introduction to Nanoelectronics
Chapter 2 ? Tri-Gate FinFET Technology and Its Advancement
Chapter 3 ? Dual-k Spacer Device Architecture and Its Electrostatics
Chapter 4 ? Capacitive Analysis and Dual-k FinFET-Based Digital Circuit Design
Chapter 5 ? Design Metric Improvement of a Dual-k-Based SRAM Cell
Chapter 6 ? Statistical Variability and Sensitivity Analysis
INDEX
