Subsecond Annealing of Advanced Materials
Annealing by Lasers, Flash Lamps and Swift Heavy Ions
Published on 23. August 2016
Book
Paperback/Softback
XVII, 321 pages
978-3-319-35287-9 (ISBN)
Description
The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.
More details
Series
Edition
Softcover reprint of the original 1st ed. 2014
Language
English
Place of publication
Cham
Switzerland
Publishing group
Springer International Publishing
Target group
Professional and scholarly
Illustrations
59 farbige Abbildungen, 146 s/w Abbildungen
XVII, 321 p. 205 illus., 59 illus. in color.
Dimensions
Height: 235 mm
Width: 155 mm
Thickness: 19 mm
Weight
517 gr
ISBN-13
978-3-319-35287-9 (9783319352879)
DOI
10.1007/978-3-319-03131-6
Schweitzer Classification
Other editions
Additional editions
Wolfgang Skorupa | Heidemarie Schmidt
Subsecond Annealing of Advanced Materials
Annealing by Lasers, Flash Lamps and Swift Heavy Ions
Book
12/2013
Springer
€53.49
Shipment within 10-15 days
Content
From the Contents: The very early time.- Nanonet formation by constitutional supercooling of pulsed laser annealed, Mn-implanted germanium.- Metastable activation of dopants by solid phase epitaxial recrystallization.- Superconducting Ga-implanted Germanium.- Structural changes in SiGe/Si layers induced by fast crystallization.