
Ion Implantation Technology
17th International Conference on Ion Implantation Technology
American Institute of Physics (Publisher)
Published on 16. January 2009
Book
Hardback
576 pages
978-0-7354-0597-4 (ISBN)
Description
The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing).
More details
Series
Edition
2008 ed.
Language
English
Place of publication
New York
United States
Target group
Professional and scholarly
Research
Illustrations
Illustrations
Dimensions
Height: 27.9 cm
Width: 21.6 cm
ISBN-13
978-0-7354-0597-4 (9780735405974)
Schweitzer Classification
Other editions
Additional editions

Edmund G. Seebauer | Susan B. Felch | Amitabh Jain
Ion Implantation Technology
17th International Conference on Ion Implantation Technology
Software
04/2009
1st Edition
American Institute of Physics
€178.08
No shipping information available