
Ion Implantation Technology
17th International Conference on Ion Implantation Technology
American Institute of Physics (Publisher)
1st Edition
Published on 1. April 2009
Software
CD-ROM
576 pages
978-0-7354-0634-6 (ISBN)
Description
The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing).
More details
Series
Language
English
Place of publication
New York
United States
Target group
Professional and scholarly
Research
Dimensions
Height: 27.9 cm
Width: 21.6 cm
ISBN-13
978-0-7354-0634-6 (9780735406346)
Schweitzer Classification
Other editions
Additional editions

Edmund G. Seebauer | Susan B. Felch | Amitabh Jain
Ion Implantation Technology
17th International Conference on Ion Implantation Technology
Book
01/2009
American Institute of Physics
€245.40
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