Silicon VLSI Technology
Fundamentals, Practice, and Modeling: International Edition
Published on 25. July 2000
Book
Paperback/Softback
817 pages
978-0-13-178458-1 (ISBN)
Description
For one-quarter/semester, senior/graduate level courses in Fabrication Processes.
Unique in approach, this text provides an integrated view of silicon technology-with an emphasis on modern computer simulation. It describes not only the manufacturing practice associated with the technologies used in silicon chip fabrication, but also the underlying scientific basis for those technologies.
Unique in approach, this text provides an integrated view of silicon technology-with an emphasis on modern computer simulation. It describes not only the manufacturing practice associated with the technologies used in silicon chip fabrication, but also the underlying scientific basis for those technologies.
More details
Language
English
Place of publication
United States
Publishing group
Pearson Education (US)
Target group
Professional and scholarly
Weight
1000 gr
ISBN-13
978-0-13-178458-1 (9780131784581)
Copyright in bibliographic data is held by Nielsen Book Services Limited or its licensors: all rights reserved.
Schweitzer Classification
Other editions
New editions
James Plummer | Michael Deal | Peter Griffin
Silicon VLSI Technology
Fundamentals, Practice, and Modeling
Book
07/2000
Pearson
€215.40
Article exhausted; check for reprint
Content
(NOTE: Chapters 3-11 include an Introduction, Historical Development and Basic Concepts, Manufacturing Methods and Equipment, Measurement Methods, Models and Simulation, Limits and Future Trends in Technologies and Models, Summary of Key Ideas, References, and Problems.)
1. Introduction and Historical Perspective.
Introduction. Integrated Circuits and the Planar Process-Key Inventions That Made It All Possible. Semiconductors. Semiconductor Devices. Semiconductor Circuit Families. Modern Scientific Discovery-Experiments, Theory and Computer Simulation. The Plan for This Book.
2. Modern CMOS Technology.
CMOS Process Flow.
3. Crystal Growth, Wafer Fabrication and Basic Properties of Silicon Wafers.
4. Semiconductor Manufacturing- Clean Rooms, Wafer Cleaning and Gettering.
5. Lithography.
6. Thermal Oxidation and the Si/SiO2 Interface.
7. Dopant Diffusion.
8. Ion Implantation.
9. Thin Film Deposition.
10. Etching.
11. Backend Technology.
1. Introduction and Historical Perspective.
Introduction. Integrated Circuits and the Planar Process-Key Inventions That Made It All Possible. Semiconductors. Semiconductor Devices. Semiconductor Circuit Families. Modern Scientific Discovery-Experiments, Theory and Computer Simulation. The Plan for This Book.
2. Modern CMOS Technology.
CMOS Process Flow.
3. Crystal Growth, Wafer Fabrication and Basic Properties of Silicon Wafers.
4. Semiconductor Manufacturing- Clean Rooms, Wafer Cleaning and Gettering.
5. Lithography.
6. Thermal Oxidation and the Si/SiO2 Interface.
7. Dopant Diffusion.
8. Ion Implantation.
9. Thin Film Deposition.
10. Etching.
11. Backend Technology.