Handbook of Thin Film Process Technology, CD-ROM
Published on 1. January 1997
Software
CD-ROM
978-0-7503-0409-2 (ISBN)
Description
The Handbook of Thin Film Process Technology, CD-ROM reproduces the text version in its entirety, including illustrations and references from the print edition. With full printing functionality, the CD has all of the added benefits associated with CD-ROM technology, such as easy searching and browsing and hypertext linking and bookmarking,. As a bonus, the CD-ROM also contains both 1996 supplements. Some of the other features include:
Compatibility with Macintosh and Windows platforms
Simple and Boolean searching
Intuitive push button data navigation through the Acrobat interface
True page image replication on the computer screen
Page zoom enlargement and reduction
Word Stemming and Word Proximity searching
Thesaurus searching
Searchable on-line users guide
Compatibility with Macintosh and Windows platforms
Simple and Boolean searching
Intuitive push button data navigation through the Acrobat interface
True page image replication on the computer screen
Page zoom enlargement and reduction
Word Stemming and Word Proximity searching
Thesaurus searching
Searchable on-line users guide
More details
Language
English
Place of publication
London
United Kingdom
Publishing group
Taylor & Francis Ltd
Target group
Professional and scholarly
Research and development scientists; engineers and technicians working in an industrial environment; graduate students and academic researchers interested in the practical aspects of thin film fabrication and processing.
Illustrations
Illustrations
Dimensions
Height: 178 mm
Width: 127 mm
Weight
98 gr
ISBN-13
978-0-7503-0409-2 (9780750304092)
Copyright in bibliographic data is held by Nielsen Book Services Limited or its licensors: all rights reserved.
Schweitzer Classification
Persons
Content
PHYSICAL DEPOSITION TECHNIQUES
Thermal Evaporation (Coordinating Editors: E.B. Graper and J. Vossen)
Introduction and general discussion (E.B. Graper)
Resistance evaporation (E.B. Graper)
Electron beam evaporation (E.B. Graper)
Ion vapor evaporation (E.B. Graper)
Cathodic arc deposition (P.J. Martin)
Laser ablation (A. Morimoto and T. Shimizu)
Molecular Beam Epitaxy (Coordinating Editors: S.A. Barnett and J. Poate)
Introduction and general discussion (S.A. Barnett and I.T. Ferguson)
Semiconductor growth by metalorganic molecular beam epitaxy (MOMBE) (C.R. Abernathy)
Gas-source MBE (G.Y. Robinson)
Chemical beam epitaxy (T.H. Chiu)
Thin film deposition and dopant incorporation by energetic particle sources (S. Strite and H. Morkoc)
Sputtering (Coordinating Editors: S.I. Shah and D. Glocker)
Introduction and general discussion (S.I. Shah)
Glow discharge sputtering (A.S. Penfold)
Magneton sputtering (A.S. Penfold)
Ion-beam sputtering (T. Itoh)
Thermal Spraying (Coordinating Editor: R.C. Tucker Jr.)
Introduction to thermal spray coatings (R.C. Tucker Jr.)
Flame spray (P.A. Kammer)
Plasma spray coatings (R.C. Tucker Jr.)
High velocity oxy-fuel coatings (R.C. Tucker Jr.)
Detonation gun deposition (R.C. Tucker Jr.)
Mechanical, wear, corrosion, and other properties of thermal spray coatings (R.C. Tucker Jr.)
CHEMICAL DEPOSITION TECHNIQUES
Chemical Vapor Deposition (Coordinating Editor: L. Vescan)
Introduction and general discussion (L. Vescan)
Metalorganic chemical vapour deposition (MOCVD) (R.D. Dupuis)
Photoassisted chemical vapour deposition (S.J.C. Irvine)
Thermally activated chemical vapour deposition (L. Vescan)
Atomic layer epitaxy (T. Suntola)
PROCESSING TECHNOLOGIES
Pattern Transfer (Coordinating Editor: J.W. Coburn
Introduction and general discussion (J.W. Coburn)
Reactive ion etching (C. Steinbruchel)
Ion-beam-based chemical dry etching (C. Steinbruchel)
Ion milling (C. Steinbruchel)
REAL-TIME DIAGNOSTICS
Introduction and General Discussion (Coordinating Editor: R.W. Collins)
Diagnostic Techniques
Reflection high-energy electron diffraction as a diagnostic technique (B.A. Joyce)
Low-energy electron diffraction (Sheng-Liang Chang and P.A. Thiel)
Reflection mass spectroscopy (R. Kaspi)
Optical Diagnostics
Infrared emission interferometry (A.J. Springthorpe)
Reflectance anisotropy (B. Drevillon)
Interferometry as an in situ probe during processing of semiconductor wafers (V.M. Donnelly)
Ellipsometry (P. Snyder)
Photoluminescence (P.R. Berger)
Elastic laser light scattering (B. Gallois)
Plasma Probes
Langmuir probe diagnostics (N. Hershkowitz)
Microwave interferometers (R.A. Breun)
Atomic absorption spectroscopy (Chih-shun Lu)
Other Diagnostics (Coordinating Editor: R. Collins)
Quartz monitors and microbalances (J. Krim and C. Daly)
Probes of film stress (D. Glocker)
SURFACE MODIFICATION IN VACUUM
Processes for Substrate Cleaning (D. Mattox)
Surface Treatment for Corrosion and Wear Protection
Material aspects of corrosion protection (Cathy Cotell)
Ion implantation with beams (Mike Nastasi)
Plasma source ion implantation (Donald Rej)
Surface Treatment of Polymers for Adhesion
Plasma sources for polymer surface treatment (M.R. Wertheimer and Edward Liston)
Surface chemistry of treated polymers (Lou Gerenser)
MATERIALS
Hard and Protective Materials
Introduction (O. Knotek and A. Schrey)
TiN
TiAIN
TiAIVN
CrN
ZrN
HfN
BN
Diamond
Ni-Cr-B-Si
Al-bronze
Al2O3-TiO2
Electronic Materials
Introduction (K. Cadien and S. Sivaram)
GaAs
a-Si:H
AlGaAs
Tellurides
CuInSe2
Si
Ge
Si-Ge
W
GaN
AIN
ErAs
Quaternaries
Silicides
SiSnC
SiN
Optical Materials
Introduction (J. Targove)
AIN
ZnO
PbTiO3
KNbO3
Ferroelectric Materials
Introduction (M. Sayer)
Bi4Ti3O12
LiNbO3 and LiTaO3
PbTiO3/PbZrTiO3
Ferromagnetic Materials
Introduction (E.M.T. Velu and D.N. Lambeth)
CoCr
TbFeCo
CoPt/CoPd
GdTbFe
Superconducting Materials
Introduction (J. Azoulay)
NbN
YBa2Cu3O7
Thallium-based compounds
Mercury-based compounds
Miscellaneous Materials
PTFE
PPN
Ir/Pt
Appendix A: List of Contributors
Subject Index
Thermal Evaporation (Coordinating Editors: E.B. Graper and J. Vossen)
Introduction and general discussion (E.B. Graper)
Resistance evaporation (E.B. Graper)
Electron beam evaporation (E.B. Graper)
Ion vapor evaporation (E.B. Graper)
Cathodic arc deposition (P.J. Martin)
Laser ablation (A. Morimoto and T. Shimizu)
Molecular Beam Epitaxy (Coordinating Editors: S.A. Barnett and J. Poate)
Introduction and general discussion (S.A. Barnett and I.T. Ferguson)
Semiconductor growth by metalorganic molecular beam epitaxy (MOMBE) (C.R. Abernathy)
Gas-source MBE (G.Y. Robinson)
Chemical beam epitaxy (T.H. Chiu)
Thin film deposition and dopant incorporation by energetic particle sources (S. Strite and H. Morkoc)
Sputtering (Coordinating Editors: S.I. Shah and D. Glocker)
Introduction and general discussion (S.I. Shah)
Glow discharge sputtering (A.S. Penfold)
Magneton sputtering (A.S. Penfold)
Ion-beam sputtering (T. Itoh)
Thermal Spraying (Coordinating Editor: R.C. Tucker Jr.)
Introduction to thermal spray coatings (R.C. Tucker Jr.)
Flame spray (P.A. Kammer)
Plasma spray coatings (R.C. Tucker Jr.)
High velocity oxy-fuel coatings (R.C. Tucker Jr.)
Detonation gun deposition (R.C. Tucker Jr.)
Mechanical, wear, corrosion, and other properties of thermal spray coatings (R.C. Tucker Jr.)
CHEMICAL DEPOSITION TECHNIQUES
Chemical Vapor Deposition (Coordinating Editor: L. Vescan)
Introduction and general discussion (L. Vescan)
Metalorganic chemical vapour deposition (MOCVD) (R.D. Dupuis)
Photoassisted chemical vapour deposition (S.J.C. Irvine)
Thermally activated chemical vapour deposition (L. Vescan)
Atomic layer epitaxy (T. Suntola)
PROCESSING TECHNOLOGIES
Pattern Transfer (Coordinating Editor: J.W. Coburn
Introduction and general discussion (J.W. Coburn)
Reactive ion etching (C. Steinbruchel)
Ion-beam-based chemical dry etching (C. Steinbruchel)
Ion milling (C. Steinbruchel)
REAL-TIME DIAGNOSTICS
Introduction and General Discussion (Coordinating Editor: R.W. Collins)
Diagnostic Techniques
Reflection high-energy electron diffraction as a diagnostic technique (B.A. Joyce)
Low-energy electron diffraction (Sheng-Liang Chang and P.A. Thiel)
Reflection mass spectroscopy (R. Kaspi)
Optical Diagnostics
Infrared emission interferometry (A.J. Springthorpe)
Reflectance anisotropy (B. Drevillon)
Interferometry as an in situ probe during processing of semiconductor wafers (V.M. Donnelly)
Ellipsometry (P. Snyder)
Photoluminescence (P.R. Berger)
Elastic laser light scattering (B. Gallois)
Plasma Probes
Langmuir probe diagnostics (N. Hershkowitz)
Microwave interferometers (R.A. Breun)
Atomic absorption spectroscopy (Chih-shun Lu)
Other Diagnostics (Coordinating Editor: R. Collins)
Quartz monitors and microbalances (J. Krim and C. Daly)
Probes of film stress (D. Glocker)
SURFACE MODIFICATION IN VACUUM
Processes for Substrate Cleaning (D. Mattox)
Surface Treatment for Corrosion and Wear Protection
Material aspects of corrosion protection (Cathy Cotell)
Ion implantation with beams (Mike Nastasi)
Plasma source ion implantation (Donald Rej)
Surface Treatment of Polymers for Adhesion
Plasma sources for polymer surface treatment (M.R. Wertheimer and Edward Liston)
Surface chemistry of treated polymers (Lou Gerenser)
MATERIALS
Hard and Protective Materials
Introduction (O. Knotek and A. Schrey)
TiN
TiAIN
TiAIVN
CrN
ZrN
HfN
BN
Diamond
Ni-Cr-B-Si
Al-bronze
Al2O3-TiO2
Electronic Materials
Introduction (K. Cadien and S. Sivaram)
GaAs
a-Si:H
AlGaAs
Tellurides
CuInSe2
Si
Ge
Si-Ge
W
GaN
AIN
ErAs
Quaternaries
Silicides
SiSnC
SiN
Optical Materials
Introduction (J. Targove)
AIN
ZnO
PbTiO3
KNbO3
Ferroelectric Materials
Introduction (M. Sayer)
Bi4Ti3O12
LiNbO3 and LiTaO3
PbTiO3/PbZrTiO3
Ferromagnetic Materials
Introduction (E.M.T. Velu and D.N. Lambeth)
CoCr
TbFeCo
CoPt/CoPd
GdTbFe
Superconducting Materials
Introduction (J. Azoulay)
NbN
YBa2Cu3O7
Thallium-based compounds
Mercury-based compounds
Miscellaneous Materials
PTFE
PPN
Ir/Pt
Appendix A: List of Contributors
Subject Index