Design for Manufacturability with Advanced Lithography
Published on 28. October 2015
XI, 164 pages
978-3-319-20385-0 (ISBN)
Description
This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.
More details
Series
Edition
1st ed. 2016
Language
English
Place of publication
Cham
Switzerland
Publishing group
Springer International Publishing
Target group
Professional and scholarly
Product notice
Reflowable
Illustrations
XI, 164 p. 100 illus., 91 illus. in color.
File size
5,49 MB
ISBN-13
978-3-319-20385-0 (9783319203850)
DOI
10.1007/978-3-319-20385-0
Schweitzer Classification
Other editions
Additional editions
Bei Yu | David Z. Pan
Design for Manufacturability with Advanced Lithography
Book
11/2015
Springer
€53.49
Shipment within 10-15 days
Content
Introduction.- Layout Decomposition for Triple Patterning.- Layout Decomposition for Other Patterning Techniques.- Standard Cell Compliance and Placement Co-Optimization.- Design for Manufacturability with E-Beam Lithography.- Conclusions and Future Works.-
