Laser and Ion Beam Modification of Materials
Proceedings of the Symposium U: Material Synthesis and Modification by Ion Beams and Laser Beams of the 3rd IUMRS International Conference on Advanced Materials, Sunshine City, Ikebukuro, Tokyo, Japan, August 31 - September 4, 1993
Published on 22. October 2013
646 pages
978-1-4831-6404-5 (ISBN)
Description
Laser and Ion Beam Modification of Materials is a compilation of materials from the proceedings of the symposium U: Material Synthesis and Modification by Ion beams and Laser Beams. This collection discusses the founding of the KANSAI Science City in Japan, and the structures, equipment, and research projects of two institutions are discussed pertaining to eV-MeV ion beams. A description of ion beams as used in materials research and in manufacturing processes, along with trends in ion implantation technology in semiconductors, is discussed. Research into ion beams by China and its industrial uses in non-semiconductor area is noted. For industrial applications, developing technology in terms of high speed, large surface modifications and use of high doses is important. Thus, the development of different ion beam approaches is examined. Industrial applications of ion and laser processing are discussed as cluster beams are used in solid state physics and chemistry. Mention is made on a high power discharge pumped solid state physics (ArF) excimer laser as a potential light source for better material processing. Under ion beam material processing is nanofabrication using focused ion beams, important for research work in mesoscopic systems. Progress in the use of ion-beam mixing using kinetic energy of ion-beams to mingle with pre-deposited surface layers of substrate materials has shown promise. Advanced materials researchers and scientists, as well as academicians in the field of nuclear physics, will find this collection helpful.
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Content
General Preface Conference Organizers, Sponsor, Advisors Co-Sponsors Supporting Sponsors Contents of Each Volume Names of Symposia and Organizing Committees Symposium U Materials Synthesis and Modification by Ion Beams and/or Laser BeamsPreface Organizers and Committees Sponsors and Session Chairmen 1. Plenary Talks Review of Ion Engineering Center Corporation and Related Research Projects in Ion Engineering Research Institute Corporation Development Program for Advanced Material-Processing and Machining Technology in Japan2. Prospects for Ion/Laser Processes The Growth of Heterostructures by Pulsed Laser Deposition Ion Beams Past and Present Trends in Ion Implantation Technology of Semiconductors Ion Beam Research in China3. Large Scale Ion Beam Systems Development of High Current Metal Ion Beams Development of a High Energy Large Sheet Ion Beam System and a Low Energy Ion Beam Deposition System Multiple Ionized-Beams System for High Deposition Rates High Energy High Current Ion Implantation System Using Variable Energy RFQ Electrostatic Accelerators Facility for Multiple Ion Beam Applications Experiment of Wide Energy Range Control for Metal Ion Beam Development of a Reentrant-Cavity-Type Electron Cyclotron Resonance (ECR) Ion Source and its Applications for Material Processing Facilities for In Situ Ion Beam Studies in Transmission Electron Microscopes 4. Ionized Cluster Beams Surface Modification with Ionized Gas-Cluster Beams Ionized Cluster Beam Source Characteristics for High-Intensity Cluster Deposition and Erosion Molecular-Dynamics Simulation of Metal Surface Sputtering by Energetic Rare-Gas Cluster Impact Irradiation Effects of Gas-Cluster Ar Ion Beams on Solid Surfaces5. Ion and Laser Processing for Industrial Applications Ionized Cluster Beam Techniques for Film Formation Fabrication of Soft X-ray Multilayer Mirrors Using Low Energy Ion Beam Modification of Large Area Glass Surfaces by Ion Implantation Investigation of Laser and Ion Beam Applications for Industrial Use High Current Metal Ion Beam Transport Through a 90° Sector Magnet Performance Characteristics of a Sheet-Shaped Microwave Ion Source Using Slot Antennas on a Rectangular Waveguide6. Thin Film Deposition by Ion Beams I Iron Film Formation by Ion Beam Deposition In-situ STM Observation of Surfaces Irradiated with Low Energy Ion Beam In-situ Subplantation of Low-Energy (~100 eV) C+ into GaAs using Combined Ion Beam and Molecular Beam Epitaxy Al/Si Epitaxial Deposition by UHV Electric-Mirror Sputtering Structural Studies on C60 Thin Films Formed by Ionized Cluster Beam Deposition Diamond-Like Carbon Films Produced by Cluster Deposition Thermal Stability of Mo-based Multilayer Soft X-ray Mirrors7. Large Scale Laser Systems High-Power High Beam Quality ArF Laser High-Repetition-Rate XeCl Excimer Laser High Repetition Rate Operation of a High Power Long Pulse XeCl Laser Beam Manipulation Techniques for KrF Excimer Laser8. Laser Processes I Formation of Low Stress SiO2 Films by Physical Vapor Deposition Using a CO2 Laser Surface Alterations of Quartz Glass with Vacuum Ultraviolet Rare Gas Excimer Lasers Chemical Processes in Laser-Induced Aerosol Formation from Vaporized Carbon Disulfide Ionic Clusters of Triazine Derivatives Produced by Matrix-Assisted N2 Laser Desorption and CO2 Laser Desorption Improvement of High Temperature Oxidation Resistance by Laser Remelted Si-Cr-Ti Coating on C103-Nb alloy Photon Assisted Implantation of B and As in Si Enhanced Vacuum Ultraviolet and X-ray Radiation from Electrically Controlled KrF Laser Plasma 9.
