Silicon Epitaxy
Academic Press
Published on 26. September 2001
491 pages
978-0-08-054100-6 (ISBN)
Description
Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.
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Additional editions
Danilo Crippa | Daniel L. Rode
Silicon Epitaxy: Volume 72
Book
09/2001
Academic Press
€210.46
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Content
1: CVD Technologies for Silicon: A Quick Survey2: Epitaxial Growth Theory: Vapor-Phase Chemistry and Doping3: Epitaxial Growth Facilities, Equipment, and Supplies4: Epitaxial Growth Techniques5: Epitaxial Growth Techniques: Molecular Beam Epitaxy6: Epitaxial Growth Modeling7: Epitaxial Layer Characterization and Metrology8: Epitaxy for Discretes and Power Devices9: Epitaxy on Patterned Wafers10: Si-Based Alloys: SiGe and SiGe:C11: Silicon Epitaxy: New Applications
