Advanced CMOS Process Technology
Published on 2. December 2012
304 pages
978-0-323-15680-6 (ISBN)
Description
Advanced CMOS Process Technology is part of the VLSI Electronics Microstructure Science series. The main topic of this book is complementary metal-oxide semiconductor or CMOS technology, which plays a significant part in the electronics systems. The topics covered in this book range from metallization, isolation techniques, reliability, and yield. The volume begins with an introductory chapter that discusses the microelectronics revolution of the 20th century. Then Chapter 2 puts focus on the CMOS devices and circuit background, discussing CMOS capacitors and field effect transistors. Metallization topics and concepts are covered in Chapter 3, while isolation techniques are tackled in Chapter 4. Long-term reliability of CMOS is the topic covered in Chapter 5. Finally, the ability of semiconductor technology to yield circuits is discussed in Chapter 6. The book is particularly addressed to engineers, scientists, and technical managers.
More details
Other editions
Additional editions
Norman G. Einspruch | etc.
Very Large Scale Integration Electronics: v. 19
Book
01/1989
Academic Press
€116.56
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Content
PrefaceChapter 1 IntroductionChapter 2 CMOS Device and Circuit Background I. Junction Diode II. Metal-Oxide-Semiconductor Capacitor III. Metal-Oxide-Semiconductor Field Effect Transistor IV. Circuit Considerations V. CMOS Latch-up ReferencesChapter 3 Metallization I. Gate Electrodes II. Reduction in Device Parasitics III. Interconnections IV. An Application of Advanced Metallization Technology V. Summary ReferencesChapter 4 Isolation Techniques I. Introduction II. Device Isolation III. Well Isolation IV. Dielectric Isolation ReferencesChapter 5 Reliability I. Channel Hot Electron Degradation II. Electromigration III. Oxide Wear-out ReferencesChapter 6 Yield I. Yield Basics II. Sources and Classification of Yield Loss III. Yield Enhancement Methodology ReferencesIndex
