
Toward Quantum FinFET
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This book reviews a range of quantum phenomena in novel nanoscale transistors called FinFETs, including quantized conductance of 1D transport, single electron effect, tunneling transport, etc. The goal is to create a fundamental bridge between quantum FinFET and nanotechnology to stimulate readers' interest in developing new types of semiconductor technology. Although the rapid development of micro-nano fabrication is driving the MOSFET downscaling trend that is evolving from planar channel to nonplanar FinFET, silicon-based CMOS technology is expected to face fundamental limits in the near future. Therefore, new types of nanoscale devices are being investigated aggressively to take advantage of the quantum effect in carrier transport. The quantum confinement effect of FinFET at room temperatures was reported following the breakthrough to sub-10nm scale technology in silicon nanowires. With chapters written by leading scientists throughout the world, Toward Quantum FinFET provides a comprehensive introduction to the field as well as a platform for knowledge sharing and dissemination of the latest advances. As a roadmap to guide further research in an area of increasing importance for the future development of materials science, nanofabrication technology, and nano-electronic devices, the book can be recommended for Physics, Electrical Engineering, and Materials Science departments, and as a reference on micro-nano electronic science and device design.
- Offers comprehensive coverage of novel nanoscale transistors with quantum confinement effect
- Provides the keys to understanding the emerging area of the quantum FinFET
- Written by leading experts in each research area
- Describes a key enabling technology for research and development of nanofabrication and nanoelectronic devices
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Content
- Intro
- Preface
- Contents
- Contributors
- Chapter 1: Simulation of Quantum Ballistic Transport in FinFETs
- 1.1 Introduction
- 1.2 Quantum Effects in FinFETs
- 1.2.1 Quantum Confinement
- 1.2.2 Quantum-Mechanical Tunneling
- 1.2.3 Ballistic Transport and Quantum Interference
- 1.3 Self-Consistent Field Method
- 1.4 The NEGF in Real-Space Representation
- 1.5 Computationally Efficient Methods in the Real Space
- 1.5.1 The Recursive Green´s Function Algorithm
- 1.5.2 The Contact Block Reduction Method
- 1.5.3 The Gauss Elimination Method
- 1.5.4 Computational Efficiency Comparison
- 1.6 The NEGF in Mode-Space Representation
- 1.6.1 Coupled Mode-Space Approach
- 1.6.2 Partial-Coupled Mode-Space Approach
- 1.6.3 Validation of the PCMS Approach
- 1.7 Conclusion
- References
- Chapter 2: Model for Quantum Confinement in Nanowires and the Application of This Model to the Study of Carrier Mobility in Na...
- 2.1 Introduction
- 2.2 Surface Energy
- 2.3 Thermodynamic Imbalance
- 2.4 Nanowire Surface Disorder
- 2.5 Quantum Confinement
- 2.6 Energy Band Gap as Function of Nanowire Diameter
- 2.7 Formula for Amorphicity
- 2.8 Models for Carrier Scattering
- 2.9 Calculated Carrier Mobility
- 2.10 Conclusions
- References
- Chapter 3: Understanding the FinFET Mobility by Systematic Experiments
- 3.1 Introduction
- 3.2 Impact of Surface Orientation
- 3.3 Impact of Strain
- 3.4 Impact of Fin Doping
- 3.5 Impact of Gate Stack
- 3.6 Conclusion
- References
- Chapter 4: Quantum Mechanical Potential Modeling of FinFET
- 4.1 Introduction
- 4.2 FinFET Structure
- 4.2.1 FinFET Design Parameters
- 4.3 Quantum Mechanical Potential Modeling
- 4.4 Threshold Voltage Modeling
- 4.5 Source/Drain Resistance Modeling
- 4.6 Results and Discussion
- 4.7 Conclusion
- References
- Chapter 5: Physical Insight and Correlation Analysis of Finshape Fluctuations and Work-Function Variability in FinFET Devices
- 5.1 Introduction
- 5.2 Modeling Approach
- 5.2.1 LER Modeling
- 5.2.2 WFV Modeling
- 5.3 Statistical Analysis of LER- and WFV-Induced Fluctuations
- 5.4 Correlation-Based Approaches for Variability Estimation
- 5.4.1 Correlations and Sensitivity Analysis
- 5.4.2 Simplified Approaches for Variability Estimation
- 5.4.2.1 Threshold Voltage Variability
- 5.4.2.2 Drive Current Variability
- 5.4.3 Physical Insight of Fin LER-Induced Threshold Voltage Increase
- 5.5 Asymmetric Impact of Localized Fluctuations
- 5.5.1 Impact of Local Fin Thinning
- 5.5.2 Impact of Grain Location and Size
- 5.6 Conclusions
- References
- Chapter 6: Characteristic and Fluctuation of Multi-fin FinFETs
- 6.1 Introduction
- 6.1.1 Random Dopant Fluctuation
- 6.1.2 Reduction Techniques of Random Dopant Fluctuation
- 6.2 Effect of Channel Fin Aspect Ratio
- 6.2.1 Triple-Fin Devices
- 6.2.2 Roll-Off Characteristics
- 6.2.3 DC/AC Characteristics
- 6.2.4 Characteristics of SRAM and Inverter
- 6.3 Channel Fin Aspect Ratio of Triple-Fin Structures
- 6.3.1 Roll-Off Characteristics of Triple-Fin Structure
- 6.3.2 AC Characteristics of Triple-Fin Structure
- 6.4 Characteristic Fluctuation of FinFET Devices
- 6.4.1 Process Variation Effect
- 6.4.2 Random Dopant Fluctuation in Digital Circuits
- 6.4.3 Intrinsic Parameter Fluctuation in Current Mirror Circuit
- 6.5 Conclusions
- References
- Chapter 7: Variability in Nanoscale FinFET Technologies
- 7.1 Introduction
- 7.2 Process Variability Mechanisms
- 7.2.1 Line Edge Roughness
- 7.2.1.1 Origins of LER
- 7.2.1.2 Modeling LER
- 7.2.2 Random Dopant Fluctuation
- 7.2.2.1 Origins of RDF
- 7.2.2.2 Modeling RDF
- 7.2.3 Other Variability Mechanisms
- 7.2.3.1 Oxide Thickness Fluctuation
- 7.2.3.2 Work Function Variation
- 7.3 Device Variability in FinFET Technologies
- 7.3.1 Inversion-Mode FinFET Technology
- 7.3.1.1 IM-FinFET Overview and Design
- 7.3.1.2 LER Impact on IM-FinFET Variability
- 7.3.1.3 RDF Impact on IM-FinFET Variability
- 7.3.1.4 Circuit-Level IM-FinFET Variability
- 7.3.2 Junctionless FinFET Technology
- 7.3.2.1 JL-FinFET Overview and Design
- 7.3.2.2 LER Impact on JL-FinFET Variability
- 7.3.2.3 RDF Impact on JL-FinFET Variability
- 7.3.3 Summary and Outlook
- 7.3.3.1 Inversion-Mode FinFETs
- 7.3.3.2 Junctionless FinFETs
- References
- Chapter 8: Random Telegraph Noise in Multi-gate FinFET/Nanowire Devices and the Impact of Quantum Confinement
- 8.1 Introduction
- 8.2 From Multi-gate Fin-FETs to GAA Nanowire-FETs: A Brief Review on the Top-Down Fabrication Method
- 8.3 Characterization of RTN in GAA SNWTs
- 8.4 Impacts of Quantum Confinement on RTN in GAA SNWTs
- 8.5 A Multiphonon-Based Quantum Model for RTN Statistics in GAA SNWTs
- 8.5.1 Wave Functions Assumption
- 8.5.2 Key Parameters Calculations
- 8.5.3 Multiphonon-Assisted Nonradiative Transition Rate
- 8.5.4 Modeling RTN Statistics
- 8.6 Summary
- References
- Chapter 9: Investigations on Transport Properties of Poly-silicon Nanowire Transistors Featuring Independent Double-Gated Conf...
- 9.1 Introduction
- 9.2 Background of Multiple-Gated Devices
- 9.3 Transport Behavior of Nanowire Devices
- 9.4 Device Structures and Fabrication
- 9.5 Electrical Characteristics at Room Temperature
- 9.6 Electrical Characteristics at Cryogenic Ambient
- 9.6.1 Evolution of Transfer Curves Under Different Operation Modes with Respect to Temperature
- 9.6.2 Model Establishment and Discussion
- 9.6.3 Observation of Hysteresis and Single Electron Effects
- 9.7 Conclusion
- References
- Chapter 10: Towards Drain Extended FinFETs for SoC Applications
- 10.1 Introduction
- 10.2 Planar Drain Extended MOS Devices
- 10.2.1 From Low to High Voltage Devices
- 10.2.2 Fundamental Design Limit: Space Charge Modulation
- 10.3 FinFET Technology
- 10.4 TCAD Calibration and Framework
- 10.5 Drain Extended FinFET Devices
- 10.6 Device Design Guidelines and Discussion
- 10.7 Conclusion
- References
- Chapter 11: Modeling FinFETs for CMOS Applications
- 11.1 Introduction
- 11.2 Compact Modeling of DG FinFETs
- 11.2.1 Current Model Development
- 11.2.2 Charge Model Development
- 11.2.3 Circuit Simulations of DG FinFETs
- 11.3 Hot Carrier Effect Modeling for FinFETs
- 11.3.1 Interface States Characterizations
- 11.3.2 Interface States Modeling
- 11.4 Quantum Effects Modeling for FinFETs
- 11.4.1 Bandstructures of Quantum FinFETs with Strain
- 11.4.2 Transports of Quantum FinFETs with Strain
- 11.5 Conclusions
- References
- Chapter 12: Enhanced Quantum Effects in Room-Temperature Coulomb Blockade Devices Based on Ultrascaled finFET Structure
- 12.1 Introduction
- 12.2 Room-Temperature Coulomb Blockade Devices Based on Ultrascaled finFET: Device Structure and Fabrication Process
- 12.3 Room-Temperature Multi-switching I-Vg Characteristics: Rough Estimation of the Charging Energy and Quantized Level Spacing
- 12.4 Room-Temperature SET/FET Hybrid Circuits: Multi-valued Literal Gate Functionality
- 12.5 Room-Temperature Charge Stability: Enhanced Coulomb Blockade and Quantum Effects in a Ultrasmall Coulomb Island with Few ...
- 12.6 Model Analysis for Interplay of the Coulomb Interaction and Additional Quantum Effects Associated with Few Electron Dot O...
- 12.7 Conclusions
- References
- Chapter 13: Single-Electron Tunneling Transistors Utilizing Individual Dopant Potentials
- 13.1 Introduction
- 13.2 Charging in Individual Dopants Observed by Low-Temperature Kelvin Probe Force Microscopy
- 13.3 Single-Electron Tunneling via an Individual Dopant Atom in Nanoscale Silicon Transistors
- 13.4 Specially Patterned Single-Dopant Transistors with Tunneling Operation at Elevated Temperatures
- 13.5 Extended Applications of Dopant-Based Devices
- 13.6 Conclusions
- References
- Chapter 14: Single-Electron Transistor and Quantum Dots on Graphene
- 14.1 Introduction
- 14.2 Graphene Single-Electron Transistor
- 14.3 A Graphene Quantum Dot with a Single-Electron Transistor as an Integrated Charge Sensor
- 14.4 Controllable Tunnel Coupling and Molecular States in A Graphene Double Quantum Dot
- 14.5 Gate-Controlled Parallel-Coupled Double Quantum Dot on Both Single-Layer and Bilayer Graphene
- References
- Chapter 15: Terahertz Response in Schottky Warp-Gate Controlled Single Electron Transistors
- 15.1 Introduction
- 15.2 Schottky Wrap-Gate Single Electron Transistors
- 15.3 Device Fabrications and Measurement
- 15.4 THz Detection by GaAs-Based Schottky Wrap-Gate SET
- 15.5 Conclusions
- References
- Index
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