Handbook of Thin Film Process Technology
98/1 Reactive Sputtering
1st Edition
Published on 18. January 2018
90 pages
978-1-351-08123-8 (ISBN)
Description
The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.
More details
Edition
1. Auflage
Language
English
Place of publication
London
United Kingdom
Publishing group
Taylor & Francis Ltd
Target group
College/higher education
File size
5,71 MB
ISBN-13
978-1-351-08123-8 (9781351081238)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Classification
Other editions
Additional editions
Book
11/2017
1st Edition
CRC Press
€185.70
Shipment within 15-20 days
Content
1. Physical Depositon Techniques 2. Chemical Depositon Techniques 3. Processing Technologies 4. Real-Time Diagnostics 5. Surface Modification in Vacuum 6. Superlattices and Multi-Layered Structures 7. Materials
