Frontiers of Thin Film Technology
Academic Press
Published on 7. November 2000
476 pages
978-0-08-054294-2 (ISBN)
Description
Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and characterization of newly emerging solid-state thin film device architectures. Volume 28 is a condensed sampler of the Handbook for use by professional scientists, engineers, and students involved in the materials, design, fabrication, diagnostics, and measurement aspects of these important new devices.
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Maurice H. Francombe
Frontiers of Thin Film Technology: Volume 28
Book
11/2000
Academic Press
€186.01
Withdrawn from sale
Persons
Content
- Front Cover
- Thin Films: Frontiers of Thin Film Technology
- Copyright Page
- Contents
- List of Contributions
- Preface
- Chapter 1. Epitaxial Film Growth and Characterization
- 1.1. Introduction
- 1.2. Epitaxial Deposition Techniques
- 1.3. Materials Characterization
- 1.4. Future Directions
- References
- Chapter 2. Field Effect Transistors: FETs and HEMTs
- 2.1. Introduction
- 2.2. HEMT Device Operation and Design
- 2.3. Scaling Issues in Ultrahigh-speed HEMTs
- 2.4. Low-Noise HEMT Design
- 2.5. Power HEMT Design
- 2.6. Material Systems for HEMT Devices
- 2.7. AIGaAs/InGaAs/GaAs Pseudomorphic HEMT (GaAs pHEMT)
- 2.8. AIInAs/GaInAs/InP (InP HEMT)
- 2.9. Conclusion
- References
- Chapter 3. Antimony-Based Infrared Materials and Devices
- 3.1. Introduction
- 3.2. Overview of Materials and Electronic Properties
- 3.3. Mechanisms Limiting the Performance of Sources and Detectors
- 3.4. Infrared Emitters
- 3.5. Infrared Detectors
- 3.6. Conclusions
- References
- Chapter 4. HgCdTe Infrared Detectors
- 4.1. Introduction
- 4.2. HgCdTe Material Properties and Background
- 4.3. HgCdTe Growth
- 4.4. Native Defects and Impurity Doping Behavior
- 4.5. Photovoltaic Detectors
- 4.6. Recent Progress in Focal Plane Arrays (FPAs)
- 4.7. Conclusions
- References
- Chapter 5. Synthesis and Characterization of Superconducting Thin Films
- 5.1. Synthesis
- 5.2. Thin Film Characterization Techniques
- 5.3. Summary
- References
- Chapter 6. Fabrication of Superconducting Devices and Circuits
- 6.1. Introduction
- 6.2. Nb Circuit Process
- 6.3. NbN Circuit Process
- 6.4. HTS Circuit Process
- 6.5. Summary
- References
- Chapter 7. Microwave Magnetic Film Devices
- 7.1. Introduction to Applications of Magnetic Films in Microwave Devices
- 7.2. Current Approaches to Fabricate Ferrite Films
- 7.3. Ferrite Film Progress
- 7.4. Monolithic Integration of Ferrite Film Devices with Semiconductors
- References
- Chapter 8. Ferroelectric Thin Films: Preparation and Characterization
- 8.1. Introduction
- 8.2. Growth Processes of Ferroelectric Thin Films
- 8.3. Processing of Ferroelectric Thin Films
- 8.4. Compound Phase Formation
- 8.5. Electrical Properties
- 8.6. Process-Property Correlation: Low-Energy Oxygen Ion Beam Bombardment Effect
- 8.7. Microstructure-Dependent Electrical Properties
- 8.8. Summary
- References
- Chapter 9. Integration Aspects of Advanced Ferroelectric Thin-Film Memories
- 9.1. Introduction
- 9.2. Design Considerations
- 9.3. Capacitor Formation
- 9.4. Electrode and Capacitor Patterning
- 9.5. Hydrogen-Containing Ambient
- 9.6. Impact of the Ferroelectric Processing on Silicon Devices
- 9.7. Equipment Issues
- 9.8. Summary and Outlook
- References
- Subject Index
- Recent Volumes In This Series
- Color Plate Section
