Beam Processing Technologies

List of ContributorsPrefaceChapter 1 Trends in MOS Integrated Circuit Technology I. Historical Perspective II. Device Scaling III. Trends in FET Design IV. Isolation V. Lithography VI. Ion Implantation VII. Dielectrics VIII. Interconnect IX. Contacts X. Reliability XI. BiCMOS XII. Memory Technology XIII. The Future ReferencesChapter 2 Laser Beam Processing and Wafer-Scale Integration I. Introduction II. Theoretical Considerations III. Results for the LIDL Process IV. Laser Beam Processing in IC Repair and Customization ReferencesChapter 3 Electron Beam Processing I. Introduction II. Interaction of Electrons with Matter III. Components for Electron Beam Machines IV. Multibeam E-Beam Machines V. Applications Involving Low Electron Energies VI. Chemical Processing ReferencesChapter 4 Ion Beam Techniques and Applications I. Introduction II. Sources for Broad-Area Ion Beams III. Sources for Submicrometer Beams IV. Parallel Processing with Broad-Area Beams V. Serial Processing with Finely Focused Beams VI. Summary ReferencesChapter 5 Silicon Molecular Beam Epitaxy: Capabilities and Trends I. Introduction II. Si MBE Technology III. Growth Mechanisms and Surface Preparation IV. Silicon Doping V. Polycrystalline Silicon VI. Application of Si MBE VII. Conclusion ReferencesChapter 6 Chemical Beam Epitaxy I. Introduction II. CBE System Design III. Substrate Preparation for Growth IV. Growth Kinetics of CBE V. Quality of Epilayers VI. Growth of Epilayers Using Group Alkyls VII. GaInAs/InP and GaAs/AlGaAs Quantum Wells and Superlattices VIII. Doping Control IX. Device Applications X. Concluding Remarks ReferencesChapter 7 Ion Implantation for VLSI I. Introduction II. Commençai Ion Implanters III. Ion Beam Production and Acceleration IV. Implantation Physics V. Problems Associated with Ion Implantation VI. Endstation Design VII. Ion Implanter System Design ReferencesChapter 8 Incoherent Radiation and Its Applications (Visible, UV, X rays) I. Introduction II. Pattern Replication III. Optical Imaging IV. Photolithographic Tools V. Deep-UV Lithography VI. X-ray Lithography VII. Thermal Processing with Incoherent Radiation VIII. Conclusion ReferencesChapter 9 Electron Beam Testing: An Outline of Techniques I. Introduction II. Introduction to the Scanning Electron Microscope III. Qualitative Voltage Contrast IV. Voltage Contrast Linearization for Potential Measurements V. Estimate of Minimum Measurable Voltage VI. Observation of Fast Voltage Waveforms and Dynamic Voltage Distributions Using a Pulsed Beam Probe VII. Electron Beam Pulsing in the Electron-Optical Column VIII. Stroboscopic and Sampling Mode Operation IX. Other Modes with Synchronous and Asynchronous Pulsed Beams X. Summary ReferencesIndex