Defect Recognition and Image Processing in Semiconductors 1997
Proceedings of the seventh conference on Defect Recognition and Image Processing, Berlin, September 1997
Published on 22. November 2017
524 pages
978-1-351-45647-0 (ISBN)
Description
Defect Recognition and Image Processing in Semiconductors 1997 provides a valuable overview of current techniques used to assess, monitor, and characterize defects from the atomic scale to inhomogeneities in complete silicon wafers. This volume addresses advances in defect analyzing techniques and instrumentation and their application to substrates, epilayers, and devices. The book discusses the merits and limits of characterization techniques; standardization; correlations between defects and device performance, including degradation and failure analysis; and the adaptation and application of standard characterization techniques to new materials. It also examines the impressive advances made possible by the increase in the number of nanoscale scanning techniques now available. The book investigates defects in layers and devices, and examines the problems that have arisen in characterizing gallium nitride and silicon carbide.
Reviews / Votes
listed in SPIE-OE Reports No 174, 1998listed in Scitech Book News, September 1998
Abstracted in INSPEC Database.
in SPIE-OE Reports No 174, 1998
listed in Scitech Book News, September 1998
Abstracted in INSPEC Database.
More details
Series
Language
English
Place of publication
London
United Kingdom
Publishing group
Taylor & Francis Ltd
Target group
Professional and scholarly
File size
16,17 MB
ISBN-13
978-1-351-45647-0 (9781351456470)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Classification
Other editions
Additional editions
J. Doneker
Defect Recognition and Image Processing in Semiconductors 1997
Proceedings of the seventh conference on Defect Recognition and Image Processing, Berlin, September 1997
Book
01/1998
1st Edition
Institute of Physics Publishing
€431.30
Shipment within 10-20 days
Person
Doneker, J.
Content
Preface. Glossary. Nanoscanning (9 papers). Electron beam methods (9 papers). Optical methods (8 papers). Mapping (10 papers). X-ray methods (4 papers). Other and combined methods (8 papers). Image processing. Standardization. Si and SiGe mixed crystals (15 papers). SiC (3 papers). GaN (6 papers). Other III-V compounds (12 papers). II-VI compounds, phosphors, oxides and alternative substrates (4 papers). Processing and defects (3 papers). Defect recognition in devices and degradation (11 papers). Author and subject indices.
