Advances in Electronics and Electron Physics
Academic Press
Published on 21. May 1979
397 pages
978-0-08-057713-5 (ISBN)
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Advances in Electronics and Electron Physics
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Ladislaus Marton
Advances in Electronics and Electron Physics: Ed.L.Marton v. 48
Book
04/1979
Academic Press
€80.47
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Content
- Cover
- Contents
- Contributors to Volume 48
- Foreword
- Chapter 1. Negative Electron Affinity Photoemitters
- I. Introduction
- II. Photocathodes Using Negative Electron Affinity
- III. Reflection Photocathodes
- IV. Photoemission by Transmission
- V. Angular Energy Distribution
- VI. NEA Photocathode Technology
- VII. Photoemission Stability and Dark Current
- VIII. Conclusion
- References
- Chapter 2. A Computational Critique of an Algorithm for Image Enhancement in Bright Field Electron Microscopy
- I. Introduction
- II. Image Theory for Bright Field Electron Microscopy
- III. Effect of Partial Coherence
- IV. Statistical Error
- V. Object Reconstruction
- VI. Programs for Numerical Tests of the Reconstruction Algorithm
- VII. Presentation and Discussion of Data
- Appendix A. Estimates of Quadratic Effects
- Appendix B. The Wiener Spectrum of the Object Set
- Appendix C. Programs for Determining W (R)
- References
- Chapter 3. Fluid Dynamics and Science of Magnetic Liquids
- I. Structure and Properties of Magnetic Fluids
- II. Fluid Dynamics of Magnetic Fluids
- III. Magnetic Fluids in Devices
- IV. Processes Based on Magnetic Fluids
- References
- Chapter 4. The Edelweiss System
- I. General-Purpose Operating Systems
- II. New Trends in Computer Architecture
- III. New Trends in Programming
- IV. Principles of EXEL
- V. Large-Scale Systems: The EDELWEISS Architecture
- VI. The Single-User Family
- Appendix A
- Appendix B
- Appendix C
- References
- Chapter 5. Electron Physics in Device Microfabrication. I General Background and Scanning System
- I. General Introduction
- II. Photon and Electron Beam Lithography for Device Microfabrication
- III. Interactions between an Electron Beam and a Resist-Coated Substrate
- IV. Electron Beam Methods for Device Microfabrication
- V. The Development of a Fast Scanning Systern"General
- VI. Design of a Fast Scanning System"Use of Thermal Cathodes
- VII. The Development of a Fast Scanning System"Use of Field Emitter Cathodes
- VIII. The Development of a Fast Scanning System-The Role of Computer"Aided Design
- IX. The Deflection Problem
- X. High-Current Effects
- References
- Author Index
- Subject Index
