
Advances in Electronics and Electron Physics
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Content
- Cover
- CONTENTS
- Contributors to Volume 47
- Foreword
- Chapter 1. Ion Beam Technology Applied to Electron Microscopy
- I. Introduction
- II. Production of Ion Beams
- III. The Sputtering Process
- IV. Ion Thinning for Transmission Electron Microscopy
- V. Ion Erosion for Scanning Electron Microscopy
- Vl. Conclusion
- References
- Chapter 2. Microprocessors and Their Use in Physics
- I. Introduction
- II. The Technology of LSI Circuits
- III. The Architecture of Microprocessors
- IV. Memory and Peripheral Devices
- V. Software
- VI. Linking the Experiment to the Microprocessor
- VII. Typical Applications
- VIII. Current and Future Trends
- Appendix I
- Appendix II
- References
- Bibliography
- Chapter 3. Wire Antennas
- I. Introduction
- II. Analysis
- III. Unloaded Antennas
- IV. Passive Loaded Antennas
- V. Active Antennas
- VI. Antenna Selection
- VII. Concluding Remarks
- References
- Chapter 4. Characterization of the MOSFET Operating in Weak Inversion
- I. Introduction
- II. Accurate Model for the Drain Current in a MOSFET
- III. Determination of the Surface State Density from Drain Current vs Drain Voltage Measurements in Weak Inversion
- IV. Influence of Potential Fluctuations on the Mobility in Weak Inversion
- V. General Conclusion
- References
- Chapter 5. Modeling of the Transient Response of an MIS Capacitor
- I. Introduction
- II. Dynamic Equations
- III. Simplest-Case Example
- IV. Computer Simulation: Flatband to Inversion Transient for MIS Structure
- V. Results
- VI. Examples
- VII. Conclusion
- List of Symbols
- References
- Author Index
- Subject Index
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