Modern GaAs Processing Methods
Published on 1. June 1990
Book
Hardback
460 pages
978-0-89006-343-9 (ISBN)
Description
Containing updated material from the first edition, this book adds several chapters covering RF testing techniques, reliability, process and manufacturing disciplines and process development (experiment by design).
More details
Series
Edition
New edition
Language
English
Place of publication
Norwood
United States
Target group
Professional and scholarly
Edition type
New edition
Product notice
Laminated cover
Illustrations
black & white illustrations
Dimensions
Height: 241 mm
Width: 157 mm
Thickness: 34 mm
Weight
885 gr
ISBN-13
978-0-89006-343-9 (9780890063439)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Classification
Content
GaAs material and crystal properties; GaAs devices; general process techniques; cleaning and cleanliness; wet etching; photolithography; nonoptical lithography; plasma processing equipment and plasma-assisted deposition; dry etching; plasma, RIE, RIBE, ion milling; specific process types; device isolation; ohmic contacts; schottky barriers and gate formation; first-level metal, dielectric formation, second-level metal; capacitors, inductors, and resistors.