Thin Film Processes
Published on 31. January 1979
Book
Hardback
564 pages
978-0-12-728250-3 (ISBN)
Description
Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.
More details
Language
English
Place of publication
San Diego
United States
Publishing group
Elsevier Science Publishing Co Inc
Target group
College/higher education
Professional and scholarly
Dimensions
Height: 234 mm
Width: 151 mm
Weight
910 gr
ISBN-13
978-0-12-728250-3 (9780127282503)
Copyright in bibliographic data is held by Nielsen Book Services Limited or its licensors: all rights reserved.
Schweitzer Classification
Other editions
Additional editions
Person
Content
Introduction. J.L. Vossen, Physical Methods of Film Deposition. J.L. Vossen and J.J. Cuomo, Glow Discharge Sputter Deposition. J.A. Thornton and A.S. Penfold, Cylindrical Magnetron Sputtering. D.B. Fraser, The Sputter and S-Gun Magnetrons. R.K. Waits, Planar Magnetron Sputtering. J.M.E. Harper, Ion Beam Deposition. Chemical Methods of Film Deposition. F.A. Lowenheim, Deposition of Inorganic Films from Solution. W. Kern and V.S. Ban, Chemical Vapor Deposition of Inorganic Thin Films. Physical-Chemical Methods of Film Deposition J.R. Hollahan and R.S. Rosler, Plasma Deposition of Inorganic Thin Films. H. Yasuda, Glow Discharge Polymerization. Etching Processes. W. Kern and C.A. Deckert, Chemical Etching. C.M. Melliar-Smith and C.J. Mogab, Plasma-Assisted Etching Techniques for Pattern Delineation. References. Index.