Polymers for Microelectronics

Chemical Amplification Mechanisms for Microlithography ; Synthesis of 4-(tert-Butoxycarbonyl)-2,6-dinitrobenzyl Tosylate: A Potential Generator and Dissolution Inhibitor Solubilizable through Chemical Amplification ; Chemically Amplified Deep-UV Photoresists Based on Acetal-Protected Poly(vinylphenols) ; Novel Analytic Method of Photoinduced Acid Generation and Evidence of Photosensitization via Matrix Resin ; Acid-Catalyzed Dehydration: A New Mechanism for Chemically Amplified Lithographic Imaging ; An Alkaline-Developable Positive Resist Based on Silylated Polyhydroxystyrene for KrF Excimer Laser Lithography ; A Test for Correlation between Residual Solvent and Rates of N-Methylpyrrolidone Absorption by Polymer Films ; Dissolution Rates of Copolymers Based on 4-Hydroxystyrene and Styrene ; Synthesis and Polymerization of N-(tert-Butoxy)maleimide and Application of Its Polymers as a Chemical Amplification Resist ; Acid-Sensitive Pyrimidine Polymers for Chemical Amplification Resists ; Methacrylate Terpolymer Approach in the Design of a Family of Chemically Amplified Positive Resists ; Surface-Imaging Resists Using Photogenerated Acid-Catalyzed SiO[2 Formation by Chemical Vapor Deposition ; Polysilphenylenesiloxane Resist with Three-Dimensional Structure ; Top-Surface Imaging Using Selective Electroless Metallization of Patterned Monolayer Films ; Langmuir-Blodgett Deposition To Evaluate Dissolution Behavior of Multicomponent Resists ; Photochemical Control of a Morphology and Solubility Transformation in Poly(vinyl alcohol) Films Induced by Interfacial Contact with Siloxanes and Phenol-Formaldehyde Polymeric Photoresists ; Advances in the Chemistry of Resists for Ionizing Radiation ; Out-of-Plane Expansion Measurements in Polyimide Films ; Radiation-Induced Modifications of Allylamino-Substituted Polyphosphazenes ; Synthesis of Perfluorinated Polyimides for Optical Applications ; Charged Species in *s-Conjugated Polysilanes as Studied by Absorption Spectroscopy with Low-Temperature Matrices ; Acid-Sensitive Phenol-Formaldehyde Polymeric Resists ; Superiority of Bis(perfluorophenyl) Azides over Nonfluorinated Analogues as Cross-Linkers in Polystyrene-Based Deep-UV Resists ; New Photoresponsive Polymers Bearing Norbornadiene Moiety Synthesis by Selective Cationic Polymerization of 2-(3-Phenyl-2,5-norbornadiene-2-carbonyloxy)ethyl Vinyl Ether and Photochemical Reaction of the Resulting Polymers ; Photoinitiated Thermolysis of Poly(5-norbornene 2, 3-dicarboxylates): A Way to Polyconjugated Systems and Photoresists ; Recent Progress of the Application of Polyimides to Microelectronics ; Base-Catalyzed Cyclization of ortho-Aromatic Amide Aklyl Esters: A Novel Approach to Chemical Imidization ; Base-Catalyzed Photosensitive Polyimide ; Novel Cross-Linking Reagents Based on 3,3-Dimethyl-1-phenylenetriazene ; Preparation of Novel Photosensitive Polyimide Systems via Long-Lived Active Intermediates ; Photoregulation of Liquid-Crystalline Orientation by Anisotropic Photochromism of Surface Azobenzenes ; Factors Affecting the Stability of Polypyrrole Films at Higher Temperatures ; Intrinsic and Thermal Stress in Polyimide Thin Films ; Fluorinated, Soluble Polyimides with High-Glass-Transition Temperatures Based on a New, Rigid, Pentacyclic Dianhydride: 12,14-Diphenyl-12,14-bis(trifluoromethyl )-12H,14H-5,7-dioxapentacene-2,3,9,10-tetracarboxylic Dianhydride ; Processable Fluorinated Acrylic Resins with Low Dielectric Constants ; Enhanced Processing of Poly(tetrafluoroethylene) for Microelectronics Applications ; Fluorinated Poly(arylene ethers) with Low Dielectric Constants ; Microstructural Characterization of Thin Polyimide Films by Positron Lifetime Spectroscopy ; Synthesis and Characterization of New Poly(arylene ether oxadiazoles)