Photomask and Next-Generation Lithography Mask Technology
X (Proceedings of SPIE)
Published on 22. October 2003
Book
Paperback/Softback
1066 pages
978-0-8194-4996-2 (ISBN)
More details
Language
English
Place of publication
Bellingham
United States
Target group
College/higher education
Professional and scholarly
Illustrations
illustrations
ISBN-13
978-0-8194-4996-2 (9780819449962)
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Schweitzer Classification