Polymers for Microelectronics - Science and Technology
Proceedings of the International Symposium on "Polymers for Microelectronics - Science and Technology" (PME '89, Tokyo, Japan, October 29 to November 2, 1989)
Published on 10. November 1990
Book
Hardback
XXV, 870 pages
978-3-527-28168-8 (ISBN)
Description
Polymers have played an important role in the development of microelectronics and are becoming ever more important for the future of microelectronics. The most important recent progress in the polymers for microelectronics, especially with regard to resist materials, was presented and discussed at "Polymers for Microelectronics (PME '89) - Science and Technology" - the first international symposium in this field to be held in Japan. About 300 researchers (70 from abroad and 230 Japanese) from all over the world attended PME '89. This volume has been organized into three sections: fundamental and applied research on resists and related compounds, polyimides and related functional polymers for electronics, and new photoresponsive polymers for optical memory and related applications. All papers were reviewed by referees.
More details
Content
Organizing and steering committees; list of contributors; preface; opening address; photo- and radiation physics and chemistry of polymers, resists materials and processes for microelectronics; new photosensitive polymers and PHB for optical memory and related applications; polyimides and related functional polymers for electronics.