Applications of Plasma Processes to V.L.S.I.Technology

This book presents state-of-the-art research in microelectronic processing for very large scale integration. Emphasizing applications and techniques, the book provides considerable insight into Japan's technological effort in this important area of science. Focused on research involving plasma deposition and dry etching, considerable attention is devoted to MOS gate fabrication, the studies of the influence of process parameters on electrical properties, dry processing technologies, and the theory of plasma chemical reactions.