
Introduction to Metrology Applications in IC Manufacturing
SPIE Press
Will be published approx. on 30. November 2015
Book
Paperback/Softback
184 pages
978-1-62841-811-8 (ISBN)
Description
Metrology has grown significantly, especially in semiconductor manufacturing, and such growth necessitates increased expertise. Until now, this field has never had a book written from the perspective of an engineer in a modern IC manufacturing and development environment. The topics in this Tutorial Text range from metrology at its most basic level to future predictions and challenges, including measurement methods, industrial applications, fundamentals of traditional measurement system characterization and calibration, semiconductor-specific applications, optical metrology measurement techniques, charged particle measurement techniques, x-ray and in situ metrology, hybrid metrology, and mask making. The accompanying CD includes example spreadsheets of measurement uncertainty analysis-specifically, precision, matching, and relative accuracy.
More details
Series
Language
English
Place of publication
Bellingham
United States
Target group
Professional and scholarly
Illustrations
CD
Dimensions
Height: 229 mm
Width: 152 mm
Weight
380 gr
ISBN-13
978-1-62841-811-8 (9781628418118)
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Schweitzer Classification