Materials Surface Processing

Structure of metallic multilayers studied by X-ray absorption spectroscopy (S. Pizzini et al.). Mechanisms of synchrotron radiation-excited etching reactions of semiconductor materials (H. Ohashi et al.). Maskless excimer laser induced projection patterning of InP in Cl2, etch gas (R. Heydel et al.). Laser direct writing of gold to repair defective lines in thin-film metallizations (D. Metzger, H. Reichl). Laser direct-write Al deposition on Si, GaAs and diamond from trialkylamine-alane precursors (F. Foulon et al.). High-intensity KrF excimer laser processing of metal surfaces (J.E. Montagne et ai.). Critical issues for single-chamber manufacturing: the role of laser technology (D.J. Ehrlich). A novel VUV photochemical deposition apparatus (C. Manfredotti et al.). Lithium niobatefilms grown by excimer laser deposition (C.N. Afonso et al.). Time-resolved diagnosis of processes in PLD of ceramics (A. Voss et al.). Bulk and surface properties of RTCVD S'3N, films for optical device applications (F. Lebland et al.). Laser ablation studies of magnesium oxide (L. Dirnberger et al.). Laser-induced modifications in a-C:H thin films (J. Spousta et al.). SF 6 sensitized C02 laser CVD of amorphous silicon (E. Golusda et al.). Laser induced plasma formation by picosecond pulse irradiation (W. Marine et al.). Laser beam deflection monitoring of Nd: YAG laser ablation: pulse shape and repetition rate effects (J. Diaci, J. Mo Zina). Tungsten silicide formation by multipulse excimer laser irradiation (S. Luby et al.). Laser deposition of thin films of high T. superconductors. In situ analysis of the transient species formed in the plume and surface diagnostics of the deposited material (A. Giardini et al.). Rapid thermal and large area processing of thin films with a line electron beam (M. Pauli et al.). Laser direct writing of titanium silicide thin films (G. Reisse et al.). Internal second-harmonic generation in CW AlGaAs SQW lasers: the facet degradation monitoring (I.V. Kravetsky et al.).