
PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing: Volume 26
Academic Press
Published on 29. October 1998
Book
Hardback
419 pages
978-0-12-533026-8 (ISBN)
Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
More details
Language
English
Place of publication
San Diego
United States
Publishing group
Elsevier Science Publishing Co Inc
Target group
College/higher education
Professional and scholarly
Thin film and surface science researchers in chemistry, materials science, electrical engineering, biology, and condensed matter physics.
Dimensions
Height: 229 mm
Width: 152 mm
Weight
810 gr
ISBN-13
978-0-12-533026-8 (9780125330268)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Classification
Other editions
Additional editions

E-Book
10/1998
Academic Press
€165.00
Available for download
Persons
Ronald A. Powell. Palo Alto, California. Novellus Systems, Inc., Palo Alto California - Stephen M. Rossnagel. Yorktown Heights, New York. IBM Corporation, T.J. Watson Research Center, Yorktown Heights, New York
Series Editor
IBM Corporation, T.J. Watson Research Center, Yorktown Heights, New York, U.S.A.
Novellus Systems, Inc., Palo Alto, California
Polytechnic University, Brooklyn, New York, U.S.A.
Content
Useful Conversion Factors and Constants
Introduction
Physics of Sputtering
Plasma Systems
The Planar Magnetron
Sputtering Tools
Directional Deposition
Planarized PVD: Use of Elevated Temperature and/or High Pressure
Ionized Magnetron Sputter Deposition
PVD Materials and Processes
Process Modeling for Magnetron Deposition
Sputtering Targets
Introduction
Physics of Sputtering
Plasma Systems
The Planar Magnetron
Sputtering Tools
Directional Deposition
Planarized PVD: Use of Elevated Temperature and/or High Pressure
Ionized Magnetron Sputter Deposition
PVD Materials and Processes
Process Modeling for Magnetron Deposition
Sputtering Targets