Interlayer Dielectrics for Semiconductor Technologies
Edited by Moshe Eizenberg
Academic Press
Published on 13. October 2003
Book
Hardback
464 pages
978-0-12-511221-5 (ISBN)
Article exhausted; check different version
Description
Semiconductor technologies are moving at such a fast pace that new materials are needed in all types of application. Manipulating the materials and their properties at atomic dimensions has become a must. This book presents the case of interlayer dielectrics materials whilst considering these challenges.
Interlayer Dielectrics for Semiconductor Technologies cover the science, properties and applications of dielectrics, their preparation, patterning, reliability and characterisation, followed by the discussion of different materials including those with high dielctric constants and those useful for waveguide applications in optical communications on the chip and the package.
Interlayer Dielectrics for Semiconductor Technologies cover the science, properties and applications of dielectrics, their preparation, patterning, reliability and characterisation, followed by the discussion of different materials including those with high dielctric constants and those useful for waveguide applications in optical communications on the chip and the package.
More details
Language
English
Place of publication
San Diego
United States
Publishing group
Elsevier Science Publishing Co Inc
Target group
Professional and scholarly
Materials Scientists, researchers and professionals with semiconductor technologies.
Illustrations
Approx. 200 illustrations; Illustrations
Dimensions
Height: 240 mm
Width: 165 mm
Weight
1040 gr
ISBN-13
978-0-12-511221-5 (9780125112215)
Copyright in bibliographic data is held by Nielsen Book Services Limited or its licensors: all rights reserved.
Schweitzer Classification
Other editions
Additional editions

Shyam P. Muraka | Moshe Eizenberg | Ashok K. Sinha
Interlayer Dielectrics for Semiconductor Technologies
E-Book
10/2003
Academic Press
€245.00
Available for download
Persons
By Shyam P Muraka
Content
Dialectric Properties, Characterization of Low Dielectric Constant Materials, Compatibilities of Dielectric Film, Silicon Based Dielectrics, Low K Polymers, Chemical Vapour Deposition of CF Low K Materials, Nanoporous Dielectric Films: Fundamental Property Relations and Microelectronic Applications, High K Dielectrics Grown by Atomic Layer Disposition, Dielectric Materials in Optical Waveguide Applications, Reliability, Future Trends in Silicon Technologies.