
Plasma Etching
An Introduction
Academic Press
Published on 8. September 1989
Book
Hardback
476 pages
978-0-12-469370-8 (ISBN)
Description
Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.
Reviews / Votes
"The subject matter is therefore well tuned to the needs of workers in the semiconductor industry, although it would also serve as an excellent textbook for a final undergraduate year or postgraduate course on the processing of semiconductor materials. This book is strongly recommended for the libraries of all universities and research laboratories working in the physical sciences." --AUSTRALIAN PHYSICIST"[The authors] have produced a comprehensive and very readable book that will be especially valuable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.? --NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, Section B: Beam Interactions with Materials and Atoms
"...They have produced a comprehensive and very readable book that will be especially vauable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.? --Thomas M. Mayer
SANDIA NATIONAL LABORATORIES
"Good discussions of plasma chemistry, plasma diagnostics and handling hazardous gases used in plasmas.? --SOCIETY OF VACUUM COATERS
More details
Language
English
Place of publication
San Diego
United States
Publishing group
Elsevier Science Publishing Co Inc
Target group
Professional and scholarly
Scientists and engineers who work with plasma in microelectronics, fusion, and space technology; graduate students in these areas.
Dimensions
Height: 229 mm
Width: 152 mm
Weight
750 gr
ISBN-13
978-0-12-469370-8 (9780124693708)
Copyright in bibliographic data and cover images is held by Nielsen Book Services Limited or by the publishers or by their respective licensors: all rights reserved.
Schweitzer Classification
Other editions
Additional editions

E-Book
09/1989
1st Edition
Elsevier
€65.39
Available for download
Persons
Editor
Princeton University, New Jersey
AT&T Bell Laboratories, Murray Hill, New Jersey
Content
D.L. Flamm and G.K. Herb, Plasma Etching Technology. An Overview. D.L. Flamm, Introduction to Plasma Chemistry. S.A. Cohen, An Introduction to Plasma Physics for Materials Processing. D.M. Manos and H.F. Dylla, Diagnostics of Plasmas for Materials Processing. A.R. Reinberg, Plasma Etch Equipment and Technology. J.M.E. Harper, Ion Beam Etching. G.K. Herb, Safety, Health, and Engineering Considerations for Plasma Processing.