Semiconductor Technology
Processing and Novel Fabrication Techniques
1st Edition
Published on 24. September 1997
Book
Hardback
XXII, 242 pages
978-0-471-12792-5 (ISBN)
Description
The product of decades of Russian research in semiconductor technology, this invaluable book offers Western researchers and engineers a wide range of new techniques, recipes, and characterization methods that provide simpler, cheaper, and more effective solutions to problems in semiconductor processing and fabrication. Many of these approaches appear here for the first time in Western technological literature.
More details
Edition
1., Auflage
Language
English
Place of publication
New York
United States
Publishing group
John Wiley and Sons Ltd
Target group
College/higher education
Professional and scholarly
Illustrations
references
Dimensions
Height: 23.6 cm
Width: 16 cm
Weight
567 gr
ISBN-13
978-0-471-12792-5 (9780471127925)
Schweitzer Classification
Persons
About the editors
Mikhail E. Levinshtein is a professor at the Ioffe Institute of the Russian Academy of Science.
Michael S. Shur teaches in the Electrical, Computer and Systems Engineering Department of Rensselaer Polytechnic Institute.
Mikhail E. Levinshtein is a professor at the Ioffe Institute of the Russian Academy of Science.
Michael S. Shur teaches in the Electrical, Computer and Systems Engineering Department of Rensselaer Polytechnic Institute.
Content
Introduction to Semiconductor Technology (E. Guk & N. Shmidt).
Transmutation Doping of Semiconductors by Charged Particles (V. Kozlovskii & L. Zakharenkov).
Polymer Diffusants in Semiconductor Technology (E. Guk, et al.).
Rare-Earth Elements in the Technology of III-V Compounds (L. Zakharenkov, et al.).
Intrinsic Point Defect Engineering in Silicon High-Voltage Power Device Technology (N. Sobolev).
Isovalent Impurity Doping of Direct-Gap III-V Semiconductor Layers (V. Chaldyshev & S. Novikov).
Surface Passivation of III-V Compounds by Inorganic Dielectrics and Polyimides (A. Gorelenok, et al.).
Precision Profiling of Semiconductor Surfaces by Photochemical Etching (D. Goryachev, et al.).
Index.
Transmutation Doping of Semiconductors by Charged Particles (V. Kozlovskii & L. Zakharenkov).
Polymer Diffusants in Semiconductor Technology (E. Guk, et al.).
Rare-Earth Elements in the Technology of III-V Compounds (L. Zakharenkov, et al.).
Intrinsic Point Defect Engineering in Silicon High-Voltage Power Device Technology (N. Sobolev).
Isovalent Impurity Doping of Direct-Gap III-V Semiconductor Layers (V. Chaldyshev & S. Novikov).
Surface Passivation of III-V Compounds by Inorganic Dielectrics and Polyimides (A. Gorelenok, et al.).
Precision Profiling of Semiconductor Surfaces by Photochemical Etching (D. Goryachev, et al.).
Index.