Protection for Semiconductor Chip Masks in the United States
Analysis of the Semiconductor Chip Protection Act of 1984
Wiley-VCH (Publisher)
Published on 18. April 1986
Book
Paperback/Softback
V, 99 pages
978-3-527-26003-4 (ISBN)
Description
Three experts describe the scope of protection provided by the Semiconductor Chip Protection Act of 1984 and the conditions imposed on eligibility for protection. They also discuss substantive and procedural issues raised by the Act, its legislative history, and the appertaining regulations promulgated by the US Copyright Office. Of particular interest to the international practitioner is the book's comprehensive discussion of protection for mask works not first commercially exploited in the United States and of the avenues available for protection of mask works developed outside the United States. The authors' explanation, by textual analysis, of the provisions of this new law and the guidelines given are indispensable aids for everybody concerned with this topic.
More details
Series
Language
German
Place of publication
Weinheim
Germany
Target group
College/higher education
Professional and scholarly
Dimensions
Height: 230 mm
Width: 150 mm
Weight
190 gr
ISBN-13
978-3-527-26003-4 (9783527260034)
Schweitzer Classification
Content
Introduction; Technological Background; Overview of the Act; Mask Works; Exclusive Rights; Term of Protection; Conditions for Protection; Retroactivity; Limitations on Exclusive Rights; Remedies; Issues Raised by the Act; Protection for Non-U.S. Mask Works; The Relationship of the Chip Act to Other U.S. Intellectual Property Laws; Registration, Deposit and Mask Work Notice; The Standards of Originality and Creativity; The Reverse Engineering Limitation on Exclusive Mask Work Rights; Conclusion; Appendix; Semiconductor Chip Protection Act of 1984; Explanatory Memorandum_Mathias-Leary Amendment; Mask Work Protection; Implementation of the Semiconductor Chip Protection Act of 1984 (Copyright Office Final Regulations); Guidelines for the Submission of Applications for Interim Protection of Mask Works.