Thin Film Processes II
Edited by John L. Vossen
Published on 23. May 1991
Book
Hardback
888 pages
978-0-12-728251-0 (ISBN)
Description
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques.
Reviews / Votes
"The editors are to be commended for producing an excellent text that should prove to be as popular as their first volume published over 20 years ago." --George H. Sigel, Jr. in OPTICS & PHOTONICS NEWS"The book is a welcome addition to the growing library of edited books on deposition processes." --SOCIETY OF VACUUM COATERS
"This book does a good job of examining film deposition and etching from the process viewpoint. Explanations of basic processes and their various parameters are clearly presented, and the reader is left with a feeling of what is and is not well understood about each process. This approach, coupled with extensive references to the general literature, should make this book valuable to both beginning and advanced reseachers in the field....In short, this book should be a worthy addition to the library of anyone working in the field of thin films." --APPLIED OPTICS
"The book will be welcomed by those who may wish to gain a broad perspective on a particular process or the techniques generally available, as well as by the specialist using such processes....The book provides an interesting juxtaposition of relatively well established procedures with quite recent and still developing techniques; it will certainly be a useful book to have around." --VACUUM
"As a status report of technology in the preparation of electronic materials, it can serve both as a reference for those within the field and an introduction to those with related interest." --JOURNAL OF METALS
"For those currently in the field of thin film research, this book would be an excellent appraisal and current reference tome. For the entering scientist, it would be a good source book and a quick study for present research." --JOURNAL OF THE ELECTROCHEMICAL SOCIETY
"This book is a valuable addition to the library of the physicist, chemist, or engineer who desires to broaden his knowledge of coating processes." --THE AUSTRALIAN PHYSICIST
More details
Language
English
Place of publication
San Diego
United States
Publishing group
Elsevier Science Publishing Co Inc
Target group
Professional and scholarly
Dimensions
Height: 229 mm
Width: 152 mm
Weight
1360 gr
ISBN-13
978-0-12-728251-0 (9780127282510)
Copyright in bibliographic data is held by Nielsen Book Services Limited or its licensors: all rights reserved.
Schweitzer Classification
Other editions
Additional editions
Werner Kern | John L. Vossen
Thin Film Processes
E-Book
05/2014
Academic Press
€54.95
Available for download
Persons
Content
J.L. Vossen and W. Kern, Introduction. S.M. Rossnagel, Glow Discharge Plasma and Sources for Etching and Deposition. C.V. Deshpandey and R.F. Bunshah, Evaporation Processes. P.P. Chow, Molecular Beam Epitaxy. R. Parsons, Sputter Deposition Processes. P.C. Johnson, The Cathodic Arc Plasma Deposition of Thin Films. K.F. Jensen and W. Kern, Thermal Chemical Vapor Deposition. K.F. Jensen and T. Kuech, Metal-Organic Chemical Vapor Deposition. J.G. Eden, Photochemical Vapor Deposition. L.C. Klein, Sol-Gel Coatings. R. Reif and W. Kern, Plasma-Enhanced Chemical Vapor Deposition. G. Lucovsky, D.V. Tsu, R.A. Rudder, and R.J. Markunas, Formation of Inorganic Films by Remote Plasma-Enhanced Chemical-Vapor Deposition. T.M. Mayer and S.D. Allen, Selected Area Processing. H.W. Lehman, Plasma-Assisted Etching. P.R. Puckett, S.L. Michel, and W.E. Hughes, Ion Beam Etching. C.I.H. Ashby, Laser-Driven Etching.